Near-field sub-diffraction photolithography with an elastomeric photomask
SCIE
SCOPUS
- Title
- Near-field sub-diffraction photolithography with an elastomeric photomask
- Authors
- CHOI, SU SEOK; Sangyoon Paik; Gwangmook Kim; Sehwan Chang; Sooun Lee; Dana Jin; Kwang-Yong Jeong; I Sak Lee; Jekwan Lee; Hongjae Moon; Jaejun Lee; Kiseok Chang; Jeongmin Moon; Soonshin Jung; Shinill Kang; Wooyoung Lee; Heon-Jin Choi; Hyunyong Choi; Hyun Jae Kim; Jae-Hyun Lee; Jinwoo Cheon; Miso Kim; Jaemin Myoung; Hong-Gyu Park; Wooyoung Shim
- Date Issued
- 2020-02
- Publisher
- NATURE PUBLISHING GROUP
- Abstract
- Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10(th) of the wavelength of the incoming light. It can be integrated into existing hardware and standard mercury lamp, and used for a variety of surfaces, such as curved, rough and defect surfaces. This method offers a higher resolution than common light-based printing systems, while enabling parallel-writing. We anticipate that it will be widely used in academic and industrial productions.
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/101277
- DOI
- 10.1038/s41467-020-14439-1
- ISSN
- 2041-1723
- Article Type
- Article
- Citation
- NATURE COMMUNICATIONS, vol. 11, no. 1, page. 805, 2020-02
- Files in This Item:
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.