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Analysis of Positive Bias Temperature Instability Degradation in n+ and p+ poly-Si Gates of High-Voltage SiO2 Dielectric nMOSFETs

Title
Analysis of Positive Bias Temperature Instability Degradation in n+ and p+ poly-Si Gates of High-Voltage SiO2 Dielectric nMOSFETs
Authors
KANG, BONG KOOYeohyeok YunJi-Hoon Seo
Date Issued
2019-11-19
Publisher
IWDTF 2019
URI
https://oasis.postech.ac.kr/handle/2014.oak/103483
Article Type
Conference
Citation
IWDTF 2019, 2019-11-19
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강봉구KANG, BONG KOO
Dept of Electrical Enginrg
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