DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, SS | - |
dc.contributor.author | Seong, TY | - |
dc.contributor.author | Kim, HS | - |
dc.contributor.author | Je, JH | - |
dc.date.accessioned | 2015-06-25T02:11:36Z | - |
dc.date.available | 2015-06-25T02:11:36Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2002-10-15 | - |
dc.identifier.issn | 0021-8979 | - |
dc.identifier.other | 2015-OAK-0000002919 | en_US |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/10508 | - |
dc.description.abstract | Heteroepitaxial growth behavior of SrRuO3/SrTiO3(001) thin films during early stages by pulsed laser deposition was investigated using synchrotron x-ray scattering, atomic force microscopy, and high-resolution transmission electron microscopy. We find that three-dimensional (3D) SrRuO3(110) islands of similar to1500 Angstrom in diameter grow at an initial stage of growth (30 Angstrom in thickness), in contrast to the two-dimensional layer growth previously reported in thick (3000 Angstrom) films by off-axis sputtering. Interestingly, the 3D islands are coherently strained to the substrate, possessing a very narrow mosaic distribution of 0.007degrees half width at half maximum. On top of the existing well-aligned islands, poorly aligned 3D islands of much smaller sizes progressively grow, reducing the interfacial strain while maintaining the small surface roughness of 9 Angstrom up to the film thickness of 420 Angstrom. (C) 2002 American Institute of Physics. | - |
dc.description.statementofresponsibility | open | en_US |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.relation.isPartOf | JOURNAL OF APPLIED PHYSICS | - |
dc.rights | BY_NC_ND | en_US |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/2.0/kr | en_US |
dc.title | Heteroepitaxial growth behavior of SrRuO3/SrTiO3(001) by pulsed laser deposition | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | en_US |
dc.identifier.doi | 10.1063/1.1505978 | - |
dc.author.google | Kim, SS | en_US |
dc.author.google | Seong, TY | en_US |
dc.author.google | Je, JH | en_US |
dc.author.google | Kim, HS | en_US |
dc.relation.volume | 92 | en_US |
dc.relation.issue | 8 | en_US |
dc.relation.startpage | 4820 | en_US |
dc.relation.lastpage | 4824 | en_US |
dc.contributor.id | 10123980 | en_US |
dc.relation.journal | JOURNAL OF APPLIED PHYSICS | en_US |
dc.relation.index | SCI급, SCOPUS 등재논문 | en_US |
dc.relation.sci | SCI | en_US |
dc.collections.name | Journal Papers | en_US |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | JOURNAL OF APPLIED PHYSICS, v.92, no.8, pp.4820 - 4824 | - |
dc.identifier.wosid | 000178318000094 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 4824 | - |
dc.citation.number | 8 | - |
dc.citation.startPage | 4820 | - |
dc.citation.title | JOURNAL OF APPLIED PHYSICS | - |
dc.citation.volume | 92 | - |
dc.contributor.affiliatedAuthor | Je, JH | - |
dc.identifier.scopusid | 2-s2.0-18744362989 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 6 | - |
dc.description.scptc | 6 | * |
dc.date.scptcdate | 2018-10-274 | * |
dc.type.docType | Article | - |
dc.subject.keywordPlus | SRRUO3 THIN-FILMS | - |
dc.subject.keywordPlus | METALLIC OXIDE SRRUO3 | - |
dc.subject.keywordPlus | ELECTRICAL-PROPERTIES | - |
dc.subject.keywordPlus | MAGNETIC-ANISOTROPY | - |
dc.subject.keywordPlus | DOMAIN-STRUCTURE | - |
dc.subject.keywordPlus | EVOLUTION | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
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