DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, SY | - |
dc.contributor.author | Hong, K | - |
dc.contributor.author | Kim, K | - |
dc.contributor.author | Yu, HK | - |
dc.contributor.author | Kim, WK | - |
dc.contributor.author | Lee, JL | - |
dc.date.accessioned | 2015-06-25T02:15:10Z | - |
dc.date.available | 2015-06-25T02:15:10Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2008-04-01 | - |
dc.identifier.issn | 0021-8979 | - |
dc.identifier.other | 2015-OAK-0000007680 | en_US |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/10606 | - |
dc.description.abstract | We report the effect of N(2), Ar, and O(2) plasma treatments on the surface properties of metals. The carbon atoms reduced more in O(2) and Ar plasma than in N(2) plasma due to a chemical reaction with O(2) plasma and large plasma density in Ar plasma. A water contact angle decreased after the plasma treatment regardless of the kinds of plasma gas, showing the increase in the hydrophilicity in surfaces. Synchrotron radiation photoemission spectroscopy data showed that the work function increased after N(2), Ar, and O(2) plasma treatments in sequence. This is due to the reduction of carbon atoms and the formation of O-rich surface in O(2) plasma case. (c) 2008 American Institute of Physics. | - |
dc.description.statementofresponsibility | open | en_US |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.relation.isPartOf | JOURNAL OF APPLIED PHYSICS | - |
dc.rights | BY_NC_ND | en_US |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/2.0/kr | en_US |
dc.title | Effect of N-2, Ar, and O-2 plasma treatments on surface properties of metals | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | en_US |
dc.identifier.doi | 10.1063/1.2874495 | - |
dc.author.google | Kim, SY | en_US |
dc.author.google | Hong, K | en_US |
dc.author.google | Lee, JL | en_US |
dc.author.google | Kim, WK | en_US |
dc.author.google | Yu, HK | en_US |
dc.author.google | Kim, K | en_US |
dc.relation.volume | 103 | en_US |
dc.relation.issue | 7 | en_US |
dc.contributor.id | 10105416 | en_US |
dc.relation.journal | JOURNAL OF APPLIED PHYSICS | en_US |
dc.relation.index | SCI급, SCOPUS 등재논문 | en_US |
dc.relation.sci | SCI | en_US |
dc.collections.name | Journal Papers | en_US |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | JOURNAL OF APPLIED PHYSICS, v.103, no.7 | - |
dc.identifier.wosid | 000255043200107 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.number | 7 | - |
dc.citation.title | JOURNAL OF APPLIED PHYSICS | - |
dc.citation.volume | 103 | - |
dc.contributor.affiliatedAuthor | Lee, JL | - |
dc.identifier.scopusid | 2-s2.0-42149146712 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 22 | - |
dc.description.scptc | 20 | * |
dc.date.scptcdate | 2018-10-274 | * |
dc.type.docType | Article | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
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