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Cited 37 time in webofscience Cited 38 time in scopus
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dc.contributor.authorKim, SY-
dc.contributor.authorHong, K-
dc.contributor.authorKim, K-
dc.contributor.authorYu, HK-
dc.contributor.authorKim, WK-
dc.contributor.authorLee, JL-
dc.date.accessioned2015-06-25T02:15:10Z-
dc.date.available2015-06-25T02:15:10Z-
dc.date.created2009-02-28-
dc.date.issued2008-04-01-
dc.identifier.issn0021-8979-
dc.identifier.other2015-OAK-0000007680en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/10606-
dc.description.abstractWe report the effect of N(2), Ar, and O(2) plasma treatments on the surface properties of metals. The carbon atoms reduced more in O(2) and Ar plasma than in N(2) plasma due to a chemical reaction with O(2) plasma and large plasma density in Ar plasma. A water contact angle decreased after the plasma treatment regardless of the kinds of plasma gas, showing the increase in the hydrophilicity in surfaces. Synchrotron radiation photoemission spectroscopy data showed that the work function increased after N(2), Ar, and O(2) plasma treatments in sequence. This is due to the reduction of carbon atoms and the formation of O-rich surface in O(2) plasma case. (c) 2008 American Institute of Physics.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfJOURNAL OF APPLIED PHYSICS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleEffect of N-2, Ar, and O-2 plasma treatments on surface properties of metals-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1063/1.2874495-
dc.author.googleKim, SYen_US
dc.author.googleHong, Ken_US
dc.author.googleLee, JLen_US
dc.author.googleKim, WKen_US
dc.author.googleYu, HKen_US
dc.author.googleKim, Ken_US
dc.relation.volume103en_US
dc.relation.issue7en_US
dc.contributor.id10105416en_US
dc.relation.journalJOURNAL OF APPLIED PHYSICSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF APPLIED PHYSICS, v.103, no.7-
dc.identifier.wosid000255043200107-
dc.date.tcdate2019-01-01-
dc.citation.number7-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume103-
dc.contributor.affiliatedAuthorLee, JL-
dc.identifier.scopusid2-s2.0-42149146712-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc22-
dc.description.scptc20*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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