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Cited 3 time in webofscience Cited 3 time in scopus
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dc.contributor.authorHan, SY-
dc.contributor.authorLee, JL-
dc.date.accessioned2015-06-25T02:15:34Z-
dc.date.available2015-06-25T02:15:34Z-
dc.date.created2009-10-08-
dc.date.issued2009-07-15-
dc.identifier.issn0021-8979-
dc.identifier.other2015-OAK-0000019160en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/10619-
dc.description.abstractThe effect of geometrical shape on the electrical transport was analyzed in SiC nanostructure Schottky diode. Two different contacts, the pillar-shaped nanostructure contact and nanoscale contact, were fabricated separately from top down method. Compared with nanoscale contact, the nanostructure contact showed the low current level, but similar Schottky barrier property. This is attributed by the fact that pillar-shaped nanostructure has smaller base areas which prevent the electrons from efficient transport into the nanostructure. This led to the decrease in electron mobility, resulting in the higher resistance in the I-V curves. From Fowler-Nordheim plot, it was almost linear for higher voltage region, but the linear behavior disappeared in the lower one. This implied that the electron tunneling was the main transport mechanism at higher electric field in this structure. (C) 2009 American Institute of Physics. [DOI:10.1063/1.3176898]-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfJOURNAL OF APPLIED PHYSICS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleCharacteristics of SiC pillar-shaped nanostructure Schottky diode-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1063/1.3176898-
dc.author.googleHan, SYen_US
dc.author.googleLee, JLen_US
dc.relation.volume106en_US
dc.relation.issue2en_US
dc.contributor.id10105416en_US
dc.relation.journalJOURNAL OF APPLIED PHYSICSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF APPLIED PHYSICS, v.106, no.2-
dc.identifier.wosid000268613000072-
dc.date.tcdate2019-01-01-
dc.citation.number2-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume106-
dc.contributor.affiliatedAuthorLee, JL-
dc.identifier.scopusid2-s2.0-68249152264-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc3-
dc.description.scptc3*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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