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Cited 86 time in webofscience Cited 95 time in scopus
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dc.contributor.authorLee, S-
dc.contributor.authorKim, H-
dc.contributor.authorPark, J-
dc.contributor.authorYong, K-
dc.date.accessioned2015-06-25T02:15:45Z-
dc.date.available2015-06-25T02:15:45Z-
dc.date.created2010-12-02-
dc.date.issued2010-10-01-
dc.identifier.issn0021-8979-
dc.identifier.other2015-OAK-0000022155en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/10625-
dc.description.abstractThis paper reports the coexistence of unipolar and bipolar resistive switching (BRS) in an Ag/ZnO/Pt structure fabricated by sputtering deposition at room temperature. The structure shows reproducible and stable unipolar resistive switching after electroforming with high compliance current (I-c) = 40 mA, regardless of the applied voltage polarity. With low I-c = 5 mA at electroforming, BRS was also observed; this phenomenon depended on the voltage polarity. Both states were stable and reproducible over 100 cycles. The switching mode was changed with adjusting Ic but the transition was irreversible. Based on the results, switching mechanism based on filament theory is proposed to explain both resistive switching. (C) 2010 American Institute of Physics. [doi:10.1063/1.3489882]-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfJOURNAL OF APPLIED PHYSICS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleCoexistence of unipolar and bipolar resistive switching characteristics in ZnO thin films-
dc.typeArticle-
dc.contributor.college화학공학과en_US
dc.identifier.doi10.1063/1.3489882-
dc.author.googleLee, Sen_US
dc.author.googleKim, Hen_US
dc.author.googleYong, Ken_US
dc.author.googlePark, Jen_US
dc.relation.volume108en_US
dc.relation.issue7en_US
dc.contributor.id10131864en_US
dc.relation.journalJOURNAL OF APPLIED PHYSICSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF APPLIED PHYSICS, v.108, no.7-
dc.identifier.wosid000283222200166-
dc.date.tcdate2019-01-01-
dc.citation.number7-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume108-
dc.contributor.affiliatedAuthorYong, K-
dc.identifier.scopusid2-s2.0-77958180651-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc66-
dc.description.scptc73*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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용기중YONG, KIJUNG
Dept. of Chemical Enginrg
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