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Cited 9 time in webofscience Cited 8 time in scopus
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dc.contributor.authorKim, TH-
dc.contributor.authorCho, H-
dc.contributor.authorBusnaina, A-
dc.contributor.authorPark, JG-
dc.contributor.authorKim, D-
dc.date.accessioned2015-06-25T02:16:32Z-
dc.date.available2015-06-25T02:16:32Z-
dc.date.created2014-03-24-
dc.date.issued2013-08-14-
dc.identifier.issn0021-8979-
dc.identifier.other2015-OAK-0000029839en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/10650-
dc.description.abstractAlthough the laser shockwave cleaning process offers a promising alternative to conventional dry-cleaning processes for nanoscale particle removal, its difficulty in removing organic particles has been an unexplained problem. This work elucidates the physics underlying the ineffectiveness of removing organic particles using laser shock cleaning utilizing polystyrene latex particles on silicon substrates. It is found that the shockwave pressure is high enough to deform the particles, increasing the contact radius and consequently the particle adhesion force. The particle deformation has been verified by high-angle scanning electron microscopy. The Maugis-Pollock theory has been applied to predict the contact radius, showing good agreement with the experiment. (C) 2013 AIP Publishing LLC.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfJOURNAL OF APPLIED PHYSICS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleShockwave-induced deformation of organic particles during laser shockwave cleaning-
dc.typeArticle-
dc.contributor.college기계공학과en_US
dc.identifier.doi10.1063/1.4818307-
dc.author.googleKim, THen_US
dc.author.googleCho, Hen_US
dc.author.googleKim, Den_US
dc.author.googlePark, JGen_US
dc.author.googleBusnaina, Aen_US
dc.relation.volume114en_US
dc.relation.issue6en_US
dc.contributor.id10103614en_US
dc.relation.journalJOURNAL OF APPLIED PHYSICSen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIEen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF APPLIED PHYSICS, v.114, no.6-
dc.identifier.wosid000323177100004-
dc.date.tcdate2019-01-01-
dc.citation.number6-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume114-
dc.contributor.affiliatedAuthorKim, D-
dc.identifier.scopusid2-s2.0-84883339798-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc1-
dc.description.scptc1*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordPlusNANOPARTICLE REMOVAL-
dc.subject.keywordPlusINDUCED PLASMA-
dc.subject.keywordPlusADHESION-
dc.subject.keywordPlusHUMIDITY-
dc.subject.keywordPlusWAVES-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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김동식KIM, DONGSIK
Dept of Mechanical Enginrg
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