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Fabrication of Oblique Submicron-Scale Structures Using Synchrotron Hard X-ray Lithography SCIE SCOPUS

Title
Fabrication of Oblique Submicron-Scale Structures Using Synchrotron Hard X-ray Lithography
Authors
KIM, KANGHYUNKyungjin ParkNAM, HYORYUNGGeon Hwee KimHONG, SEONG KYUNGKIM, SU HYEONWOO, HYUN SOOYOON, SEUNG BINKIM, JONG HYUNLIM, GEUN BAE
Date Issued
2021-03
Publisher
MDPI Open Access Publishing
Abstract
Oblique submicron-scale structures are used in various aspects of research, such as the directional characteristics of dry adhesives and wettability. Although deposition, etching, and lithography techniques are applied to fabricate oblique submicron-scale structures, these approaches have the problem of the controllability or throughput of the structures. Here, we propose a simple X-ray-lithography method, which can control the oblique angle of submicron-scale structures with areas on the centimeter scale. An X-ray mask was fabricated by gold film deposition on slanted structures. Using this mask, oblique ZEP520A photoresist structures with slopes of 20 degrees and 10 degrees and widths of 510 nm and 345 nm were fabricated by oblique X-ray exposure, and the possibility of polydimethylsiloxane (PDMS) molding was also confirmed. In addition, through double exposure with submicron- and micron-scale X-ray masks, dotted-line patterns were produced as an example of multiscale patterning.
URI
https://oasis.postech.ac.kr/handle/2014.oak/106866
DOI
10.3390/polym13071045
ISSN
2073-4360
Article Type
Article
Citation
Polymers, vol. 13, no. 17, page. 1045 - 1045, 2021-03
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임근배LIM, GEUN BAE
Dept of Mechanical Enginrg
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