DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Dong Kyu | - |
dc.contributor.author | Park, Yunkyu | - |
dc.contributor.author | Sim, Hyeji | - |
dc.contributor.author | Park, Jinheon | - |
dc.contributor.author | Kim, Younghak | - |
dc.contributor.author | Kim, Gi-Yeop | - |
dc.contributor.author | Eom, Chang-Beom | - |
dc.contributor.author | Choi, Si-Young | - |
dc.contributor.author | Son, Junwoo | - |
dc.date.accessioned | 2022-01-10T05:50:03Z | - |
dc.date.available | 2022-01-10T05:50:03Z | - |
dc.date.created | 2021-10-10 | - |
dc.date.issued | 2021-08 | - |
dc.identifier.issn | 2041-1723 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/109124 | - |
dc.description.abstract | Unrestricted integration of single-crystal oxide films on arbitrary substrates has been of great interest to exploit emerging phenomena from transition metal oxides for practical applications. Here, we demonstrate the release and transfer of a freestanding single-crystalline rutile oxide nanomembranes to serve as an epitaxial template for heterogeneous integration of correlated oxides on dissimilar substrates. By selective oxidation and dissolution of sacrificial VO2 buffer layers from TiO2/VO2/TiO2 by H2O2, millimeter-size TiO2 single-crystalline layers are integrated on silicon without any deterioration. After subsequent VO2 epitaxial growth on the transferred TiO2 nanomembranes, we create artificial single-crystalline oxide/Si heterostructures with excellent sharpness of metal-insulator transition (Delta rho/rho > 10(3)) even in ultrathin (<10 nm) VO2 films that are not achievable via direct growth on Si. This discovery offers a synthetic strategy to release the new single-crystalline oxide nanomembranes and an integration scheme to exploit emergent functionality from epitaxial oxide heterostructures in mature silicon devices. | - |
dc.language | English | - |
dc.publisher | Nature Publishing Group | - |
dc.relation.isPartOf | Nature Communications | - |
dc.title | Heterogeneous integration of single-crystalline rutile nanomembranes with steep phase transition on silicon substrates | - |
dc.type | Article | - |
dc.identifier.doi | 10.1038/s41467-021-24740-2 | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | Nature Communications, v.12, no.1 | - |
dc.identifier.wosid | 000686713800018 | - |
dc.citation.number | 1 | - |
dc.citation.title | Nature Communications | - |
dc.citation.volume | 12 | - |
dc.contributor.affiliatedAuthor | Lee, Dong Kyu | - |
dc.contributor.affiliatedAuthor | Park, Yunkyu | - |
dc.contributor.affiliatedAuthor | Sim, Hyeji | - |
dc.contributor.affiliatedAuthor | Park, Jinheon | - |
dc.contributor.affiliatedAuthor | Kim, Younghak | - |
dc.contributor.affiliatedAuthor | Kim, Gi-Yeop | - |
dc.contributor.affiliatedAuthor | Choi, Si-Young | - |
dc.contributor.affiliatedAuthor | Son, Junwoo | - |
dc.identifier.scopusid | 2-s2.0-85113242116 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | Y | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | METAL-INSULATOR-TRANSITION | - |
dc.subject.keywordPlus | VO2 THIN-FILMS | - |
dc.subject.keywordPlus | ULTRATHIN FILMS | - |
dc.subject.keywordPlus | NOBEL LECTURE | - |
dc.relation.journalWebOfScienceCategory | Multidisciplinary Sciences | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
library@postech.ac.kr Tel: 054-279-2548
Copyrights © by 2017 Pohang University of Science ad Technology All right reserved.