DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chen, YT | - |
dc.contributor.author | Lo, TN | - |
dc.contributor.author | Chiu, CW | - |
dc.contributor.author | Wang, JY | - |
dc.contributor.author | Wang, CL | - |
dc.contributor.author | Liu, CJ | - |
dc.contributor.author | Wu, SR | - |
dc.contributor.author | Jeng, ST | - |
dc.contributor.author | Yang, CC | - |
dc.contributor.author | Shiue, J | - |
dc.contributor.author | Chen, CH | - |
dc.contributor.author | Hwu, Y | - |
dc.contributor.author | Yin, GC | - |
dc.contributor.author | Lin, HM | - |
dc.contributor.author | Je, JH | - |
dc.contributor.author | Margaritondo, G | - |
dc.date.accessioned | 2015-06-25T02:28:44Z | - |
dc.date.available | 2015-06-25T02:28:44Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2008-03 | - |
dc.identifier.issn | 0909-0495 | - |
dc.identifier.other | 2015-OAK-0000007528 | en_US |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/11037 | - |
dc.description.abstract | The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-out temperatures and durations for the photoresist, and the use of a developer without methylisobutylketone. Electrodeposition with a pulsed current mode and with a specially designed apparatus produced the desired high-aspect-ratio nanostructures. The fabricated zone plates were examined by electron microscopy and their performances were assessed using a transmission X-ray microscope. The results specifically demonstrated an image resolution of 40 nm. (C) 2008 International Union of Crystallography. | - |
dc.description.statementofresponsibility | open | en_US |
dc.language | English | - |
dc.publisher | BLACKWELL PUBLISHING | - |
dc.relation.isPartOf | JOURNAL OF SYNCHROTRON RADIATION | - |
dc.rights | BY_NC_ND | en_US |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/2.0/kr | en_US |
dc.title | Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | en_US |
dc.identifier.doi | 10.1107/S0909049507063510 | - |
dc.author.google | Chen, YT | en_US |
dc.author.google | Lo, TN | en_US |
dc.author.google | Margaritondo, G | en_US |
dc.author.google | Je, JH | en_US |
dc.author.google | Lin, HM | en_US |
dc.author.google | Yin, GC | en_US |
dc.author.google | Hwu, Y | en_US |
dc.author.google | Chen, CH | en_US |
dc.author.google | Shiue, J | en_US |
dc.author.google | Yang, CC | en_US |
dc.author.google | Jeng, ST | en_US |
dc.author.google | Wu, SR | en_US |
dc.author.google | Liu, CJ | en_US |
dc.author.google | Wang, CL | en_US |
dc.author.google | Wang, JY | en_US |
dc.author.google | Chiu, CW | en_US |
dc.relation.volume | 15 | en_US |
dc.relation.startpage | 170 | en_US |
dc.relation.lastpage | 175 | en_US |
dc.contributor.id | 10123980 | en_US |
dc.relation.journal | JOURNAL OF SYNCHROTRON RADIATION | en_US |
dc.relation.index | SCI급, SCOPUS 등재논문 | en_US |
dc.relation.sci | SCI | en_US |
dc.collections.name | Journal Papers | en_US |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | JOURNAL OF SYNCHROTRON RADIATION, v.15, pp.170 - 175 | - |
dc.identifier.wosid | 000253244100009 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 175 | - |
dc.citation.startPage | 170 | - |
dc.citation.title | JOURNAL OF SYNCHROTRON RADIATION | - |
dc.citation.volume | 15 | - |
dc.contributor.affiliatedAuthor | Je, JH | - |
dc.identifier.scopusid | 2-s2.0-40049106623 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 17 | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | LOCALIZED ELECTROCHEMICAL DEPOSITION | - |
dc.subject.keywordPlus | ELECTRODEPOSITION | - |
dc.subject.keywordPlus | NANOLITHOGRAPHY | - |
dc.subject.keywordPlus | METHACRYLATE | - |
dc.subject.keywordPlus | DEVICES | - |
dc.subject.keywordPlus | TIME | - |
dc.subject.keywordAuthor | Fresnel zone plate | - |
dc.subject.keywordAuthor | e-beam lithography | - |
dc.subject.keywordAuthor | electrodeposition | - |
dc.subject.keywordAuthor | nanofabrication | - |
dc.subject.keywordAuthor | X-ray microscope | - |
dc.relation.journalWebOfScienceCategory | Instruments & Instrumentation | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Instruments & Instrumentation | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalResearchArea | Physics | - |
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