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dc.contributor.authorJung, Ju-Hyun-
dc.contributor.authorYang, Seong-Jun-
dc.contributor.authorKIM, CHEOL JOO-
dc.date.accessioned2022-03-07T02:01:22Z-
dc.date.available2022-03-07T02:01:22Z-
dc.date.created2022-03-04-
dc.date.issued2021-11-09-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/110611-
dc.publisherKIEEME-
dc.relation.isPartOf6th International Conference on Advanced Electromaterials-
dc.titleAtomic-scale, thickness control of hexagonal boron nitride tunnel barriers-
dc.typeConference-
dc.type.rimsCONF-
dc.identifier.bibliographicCitation6th International Conference on Advanced Electromaterials-
dc.citation.conferenceDate2021-11-09-
dc.citation.conferencePlaceKO-
dc.citation.title6th International Conference on Advanced Electromaterials-
dc.contributor.affiliatedAuthorJung, Ju-Hyun-
dc.contributor.affiliatedAuthorYang, Seong-Jun-
dc.contributor.affiliatedAuthorKIM, CHEOL JOO-
dc.description.journalClass1-
dc.description.journalClass1-

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김철주KIM, CHEOL JOO
Dept. of Chemical Enginrg
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