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Cited 4 time in webofscience Cited 4 time in scopus
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dc.contributor.authorKim, IW-
dc.contributor.authorKwon, YB-
dc.contributor.authorYi, JM-
dc.contributor.authorJe, JH-
dc.contributor.authorNouet, G-
dc.contributor.authorWojtowicz, T-
dc.contributor.authorRuterana, P-
dc.contributor.authorKioseoglou, J-
dc.date.accessioned2015-06-25T02:34:27Z-
dc.date.available2015-06-25T02:34:27Z-
dc.date.created2009-02-28-
dc.date.issued2004-09-
dc.identifier.issn0734-2101-
dc.identifier.other2015-OAK-0000004624en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/11223-
dc.description.abstractTwin formation and strain evolution in highly mismatched sputter-grown ZnO/Al2O3(0001) hereroepitaxial films were investigated using real time synchrotron x-ray scattering measurements and high resolution electron microscopy (HREM). We reveal the existence of a critical thickness at which the twin of the 30degrees rotated domains starts to nucleate within the ZnO films, followed by gradual strain relaxation. Twin growth above the critical thickness stops as the strain almost fully relaxes. A HREM image shows that the twin nucleates 5-10 nm away from the interface as isolated domains, not as types of layers. (C) 2004 American Vacuum Society.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherA V S AMER INST PHYSICS-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleTwin formation in sputter-grown ZnO/Al2O3(0001) epitaxial film: A real time x-ray scattering study-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1116/1.1778407-
dc.author.googleKim, IWen_US
dc.author.googleKwon, YBen_US
dc.author.googleKioseoglou, Jen_US
dc.author.googleRuterana, Pen_US
dc.author.googleWojtowicz, Ten_US
dc.author.googleNouet, Gen_US
dc.author.googleJe, JHen_US
dc.author.googleYi, JMen_US
dc.relation.volume22en_US
dc.relation.issue5en_US
dc.relation.startpage2159en_US
dc.relation.lastpage2162en_US
dc.contributor.id10123980en_US
dc.relation.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Aen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.22, no.5, pp.2159 - 2162-
dc.identifier.wosid000224591600038-
dc.date.tcdate2019-01-01-
dc.citation.endPage2162-
dc.citation.number5-
dc.citation.startPage2159-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-
dc.citation.volume22-
dc.contributor.affiliatedAuthorJe, JH-
dc.identifier.scopusid2-s2.0-8344232294-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc4-
dc.description.scptc4*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordPlusMOLECULAR-BEAM EPITAXY-
dc.subject.keywordPlusZNO THIN-FILMS-
dc.subject.keywordPlusSTRUCTURAL EVOLUTION-
dc.subject.keywordPlusSAPPHIRE-
dc.subject.keywordPlusDEFECTS-
dc.subject.keywordPlusHETEROEPITAXY-
dc.subject.keywordPlusINTERFACES-
dc.subject.keywordPlusRELAXATION-
dc.subject.keywordPlusDEPOSITION-
dc.subject.keywordPlusINPLANE-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-

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제정호JE, JUNG HO
Dept of Materials Science & Enginrg
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