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dc.contributor.authorHsu, PC-
dc.contributor.authorWang, CH-
dc.contributor.authorYang, TY-
dc.contributor.authorHwu, YK-
dc.contributor.authorLin, CS-
dc.contributor.authorChen, CH-
dc.contributor.authorChang, LW-
dc.contributor.authorSeol, SK-
dc.contributor.authorJe, JH-
dc.contributor.authorMargaritondo, G-
dc.date.accessioned2015-06-25T02:34:48Z-
dc.date.available2015-06-25T02:34:48Z-
dc.date.created2009-02-28-
dc.date.issued2007-05-
dc.identifier.issn0734-2101-
dc.identifier.other2015-OAK-0000006893en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/11234-
dc.description.abstractThe authors describe an electroless deposition method for thin films, based on the irradiation by an x-ray beam emitted by a synchrotron source. Specifically, Ni-P films were deposited at room temperature. This synthesis is a unique combination of photochemical and electrochemical processes. The influence of the pH value on the formation and structural properties of the films was examined by various characterization tools including scanning electron microscopy, x-ray diffraction, and x-ray absorption spectroscopy. Real time monitoring of the deposition process by coherent x-ray microscopy reveals that the formation of hydrogen bubbles leads to a self-catalysis effect without a preexisting catalyst. The mechanisms underlying the deposition process are discussed in details. (C) 2007 American Vacuum Society.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherA V S AMER INST PHYSICS-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titlePhotosynthesis and structure of electroless Ni-P films by synchrotron x-ray irradiation-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1119/1.2731349-
dc.author.googleHsu, PCen_US
dc.author.googleWang, CHen_US
dc.author.googleMargaritondo, Gen_US
dc.author.googleJe, JHen_US
dc.author.googleSeol, SKen_US
dc.author.googleChang, LWen_US
dc.author.googleChen, CHen_US
dc.author.googleLin, CSen_US
dc.author.googleHwu, YKen_US
dc.author.googleYang, TYen_US
dc.relation.volume25en_US
dc.relation.issue3en_US
dc.relation.startpage615en_US
dc.relation.lastpage620en_US
dc.contributor.id10123980en_US
dc.relation.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Aen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.25, no.3, pp.615 - 620-
dc.identifier.wosid000246746100033-
dc.date.tcdate2019-01-01-
dc.citation.endPage620-
dc.citation.number3-
dc.citation.startPage615-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-
dc.citation.volume25-
dc.contributor.affiliatedAuthorJe, JH-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc9-
dc.type.docTypeArticle-
dc.subject.keywordPlusDEPOSITION-
dc.subject.keywordPlusGOLD-
dc.subject.keywordPlusNANOPARTICLES-
dc.subject.keywordPlusMECHANISM-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-

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제정호JE, JUNG HO
Dept of Materials Science & Enginrg
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