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dc.contributor.authorChoi, KJ-
dc.contributor.authorLee, JL-
dc.date.accessioned2015-06-25T02:35:26Z-
dc.date.available2015-06-25T02:35:26Z-
dc.date.created2009-02-28-
dc.date.issued2001-05-
dc.identifier.issn1071-1023-
dc.identifier.other2015-OAK-0000002045en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/11255-
dc.description.abstractSurface states on n-type Al0.24Ga0.76As were studied using capacitance deep-level transient spectroscopy (DLTS). Two types of hole-like traps (labeled as H1 and H2 in this work) were observed in a Al0.24Ga0.76As/In(0.22)Ga(0.78)AS pseudomorphic high-electron-mobility transistor with a multifinger gate. But, no hole-like traps were observed in the fat field-effect transistor (FATFET) having a negligible ratio of the ungated surface to the total area between the source and the drain. This provides evidence that the hole-like trap peaks in the DLTS spectra originated from surface states at the ungated Al(0.24)Ga(0.76)AS regions exposed between gate and source/drain electrodes. The activation energies for both surface states were determined to be 0.50 +/-0.03 and 0.81 +/-0.01 eV. The comparison of activation energies of the two surface states with the Schottky barrier height 0.66 +/-0.01 eV suggests that H1 and H2 are deeply related to the Fermi energy pinning levels at the Al0.24Ga0.76As surface. (C) 2001 American Vacuum Society.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleSurface states on n-type Al0.24Ga0.76As characterized by deep-level transient spectroscopy-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1116/1.1368679-
dc.author.googleChoi, KJen_US
dc.author.googleLee, JLen_US
dc.relation.volume19en_US
dc.relation.issue3en_US
dc.relation.startpage615en_US
dc.relation.lastpage621en_US
dc.contributor.id10105416en_US
dc.relation.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ben_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.19, no.3, pp.615 - 621-
dc.identifier.wosid000169366600003-
dc.date.tcdate2019-01-01-
dc.citation.endPage621-
dc.citation.number3-
dc.citation.startPage615-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.volume19-
dc.contributor.affiliatedAuthorLee, JL-
dc.identifier.scopusid2-s2.0-0035326449-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc8-
dc.type.docTypeArticle-
dc.subject.keywordPlusELECTRON-MOBILITY TRANSISTOR-
dc.subject.keywordPlusMOLECULAR-BEAM EPITAXY-
dc.subject.keywordPlusGAAS-MESFETS-
dc.subject.keywordPlusTRANSCONDUCTANCE DISPERSION-
dc.subject.keywordPlusCARRIER CAPTURE-
dc.subject.keywordPlusDLTS SPECTRA-
dc.subject.keywordPlusTRAPS-
dc.subject.keywordPlusSEMICONDUCTORS-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-

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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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