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Cited 8 time in webofscience Cited 12 time in scopus
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dc.contributor.authorRyu, Y-
dc.contributor.authorYong, KJ-
dc.date.accessioned2015-06-25T02:36:07Z-
dc.date.available2015-06-25T02:36:07Z-
dc.date.created2009-04-02-
dc.date.issued2005-09-
dc.identifier.issn1071-1023-
dc.identifier.other2015-OAK-0000005467en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/11277-
dc.description.abstractA large quantity of highly uniform SiC nanowires was directly synthesized from Si substrates using a thermal heating method. The atomic structure, morphology, and composition of the SiC nanowires were strongly dependent on the ambient gases (Ar,N-2) used during nanowire- growth. The nanowires grown in Ar were coated with amorphous carbon layers while the nanowires grown in N-2 had no coating layers. Also, nitrogen and oxygen were incorporated only into SiC nanowires grown in N-2. A proposed model for the role of ambient gases in the SiC nanowire growth is discussed. (c) 2005 American Vacuum Society.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherA V S AMER INST PHYSICS-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleEffects of ambient gases on the direct growth of SiC nanowires by a simple heating method-
dc.typeArticle-
dc.contributor.college화학공학과en_US
dc.identifier.doi10.1116/1.2050667-
dc.author.googleRyu, Yen_US
dc.author.googleYong, KJen_US
dc.relation.volume23en_US
dc.relation.issue5en_US
dc.relation.startpage2069en_US
dc.relation.lastpage2072en_US
dc.contributor.id10131864en_US
dc.relation.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ben_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.23, no.5, pp.2069 - 2072-
dc.identifier.wosid000232643600040-
dc.date.tcdate2019-01-01-
dc.citation.endPage2072-
dc.citation.number5-
dc.citation.startPage2069-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.volume23-
dc.contributor.affiliatedAuthorYong, KJ-
dc.identifier.scopusid2-s2.0-31144462268-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc8-
dc.description.scptc12*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordPlusLASER-ABLATION-
dc.subject.keywordPlusSILICON-
dc.subject.keywordPlusNANORODS-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-

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용기중YONG, KIJUNG
Dept. of Chemical Enginrg
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