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Cited 6 time in webofscience Cited 6 time in scopus
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dc.contributor.authorHan, SY-
dc.contributor.authorLee, JL-
dc.contributor.authorPearton, SJ-
dc.date.accessioned2015-06-25T02:36:38Z-
dc.date.available2015-06-25T02:36:38Z-
dc.date.created2009-10-08-
dc.date.issued2009-07-
dc.identifier.issn1071-1023-
dc.identifier.other2015-OAK-0000019162en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/11293-
dc.description.abstractElectrical properties of the contacts consisting of nanoscale junctions separated within the Debye length (multinanocontact) were characterized both experimentally and numerically. The reduction in contact size from micrometer into the nanometer scale led to a decrease in effective Schottky barrier height from 1.69 to 1.09 eV and a much higher reverse leakage current density. This originated from a narrower barrier height beneath the contact, resulting in the increase in the tunneling current. In a multinanoscale contact separated within Debye length, the current density was expected to be higher than that of individual nanocontact (single nanocontact). This was attributed by the facts that in the multinanocontacts, the peripheral area of the depletion region would be thicker than that of the single nanocontact due to the extension of each depletion width. Thus this causes the decrease in the tunneling probability through the edge of depletion region, leading to the decreased current density in the multinanoscale contact.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherA V S AMER INST PHYSICS-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleElectrical properties of nanoscale Au contacts on 4H-SiC-
dc.typeArticle-
dc.contributor.college신소재공학과en_US
dc.identifier.doi10.1116/1.3154517-
dc.author.googleHan, SYen_US
dc.author.googleLee, JLen_US
dc.author.googlePearton, SJen_US
dc.relation.volume27en_US
dc.relation.issue4en_US
dc.relation.startpage1870en_US
dc.relation.lastpage1873en_US
dc.contributor.id10105416en_US
dc.relation.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ben_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.27, no.4, pp.1870 - 1873-
dc.identifier.wosid000268535600018-
dc.date.tcdate2019-01-01-
dc.citation.endPage1873-
dc.citation.number4-
dc.citation.startPage1870-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.volume27-
dc.contributor.affiliatedAuthorLee, JL-
dc.identifier.scopusid2-s2.0-68349153010-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc4-
dc.description.scptc4*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordPlusMETAL-SEMICONDUCTOR INTERFACES-
dc.subject.keywordPlusSCHOTTKY-
dc.subject.keywordPlusTRANSPORT-
dc.subject.keywordPlusNANOWIRES-
dc.subject.keywordPlusDIODES-
dc.subject.keywordAuthorgold-
dc.subject.keywordAuthorleakage currents-
dc.subject.keywordAuthornanocontacts-
dc.subject.keywordAuthornanostructured materials-
dc.subject.keywordAuthorprobability-
dc.subject.keywordAuthorSchottky barriers-
dc.subject.keywordAuthorsemiconductor-metal boundaries-
dc.subject.keywordAuthorsilicon compounds-
dc.subject.keywordAuthortunnelling-
dc.subject.keywordAuthorwide band gap semiconductors-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-

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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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