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Cited 128 time in webofscience Cited 130 time in scopus
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dc.contributor.authorKim, HC-
dc.contributor.authorLee, JK-
dc.contributor.authorShon, JW-
dc.date.accessioned2015-06-25T03:20:28Z-
dc.date.available2015-06-25T03:20:28Z-
dc.date.created2009-02-28-
dc.date.issued2003-11-
dc.identifier.issn1070-664X-
dc.identifier.other2015-OAK-0000003761en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/12571-
dc.description.abstractA homogeneous plasma model for dual radio-frequency (rf) discharges driven by two sinusoidal current sources has been analyzed. Under the assumptions of time-independent and collisionless ion motion and inertialess electrons, the analytic expressions for discharge parameters are obtained as a function of the effective parameters such as effective frequency, effective current, and effective voltage. Effective parameters are determined by the ratio of two currents or voltages. Two rf sources are generally coupled to each other through the plasma medium. It is also shown that the reduction of the bulk plasma length due to the sheath size has to be considered for calculating the discharge parameters since the sheath length is not always negligible compared to the bulk plasma length. Furthermore, the dependence of discharge parameters on the low frequency is presented. (C) 2003 American Institute of Physics.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfPHYSICS OF PLASMAS-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleAnalytic model for a dual frequency capacitive discharge-
dc.typeArticle-
dc.contributor.college전자전기공학과en_US
dc.identifier.doi10.1063/1.1621000-
dc.author.googleKim, HCen_US
dc.author.googleLee, JKen_US
dc.author.googleShon, JWen_US
dc.relation.volume10en_US
dc.relation.issue11en_US
dc.relation.startpage4545en_US
dc.relation.lastpage4551en_US
dc.contributor.id10158178en_US
dc.relation.journalPHYSICS OF PLASMASen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationPHYSICS OF PLASMAS, v.10, no.11, pp.4545 - 4551-
dc.identifier.wosid000185989400041-
dc.date.tcdate2019-01-01-
dc.citation.endPage4551-
dc.citation.number11-
dc.citation.startPage4545-
dc.citation.titlePHYSICS OF PLASMAS-
dc.citation.volume10-
dc.contributor.affiliatedAuthorLee, JK-
dc.identifier.scopusid2-s2.0-0344980603-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc99-
dc.description.scptc100*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordPlusRF DISCHARGE-
dc.subject.keywordPlusELECTRODE SHEATHS-
dc.subject.keywordPlusCOUPLED PLASMA-
dc.subject.keywordPlusENERGY-
dc.subject.keywordPlusTRANSITION-
dc.subject.keywordPlusARGON-
dc.subject.keywordPlusMHZ-
dc.relation.journalWebOfScienceCategoryPhysics, Fluids & Plasmas-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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