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dc.contributor.authorJang, D-
dc.contributor.authorOh, JH-
dc.contributor.authorLee, JM-
dc.contributor.authorKim, D-
dc.date.accessioned2015-06-25T03:26:21Z-
dc.date.available2015-06-25T03:26:21Z-
dc.date.created2011-03-10-
dc.date.issued2009-01-
dc.identifier.issn0277-786X-
dc.identifier.other2015-OAK-0000022825en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/12718-
dc.description.abstractIt has been shown that the laser shock cleaning (LSC) process is effective for removing nanoscale particles from solid surfaces and thus has various potential applications in microelectronic manufacturing. In this work, we propose a simple method to amplify the shock wave intensity generated by laser-induced breakdown (LIB) of air. The suggested scheme employs a plane shock wave reflector which confines the plasma expansion in one direction. As the half of the LIB-induced shock wave is reflected by the reflector, the intensity of the shock wave propagating in the opposite direction is increased significantly. Accordingly, the enhanced shock wave can remove smaller particles from the surface than the existing LSC process. The LSC process under geometrical confinement is analyzed both theoretically and experimentally. Numerical computation of the plasma/shock behavior shows about two times pressure amplification for the plane geometry. Experiments confirm that the shock wave intensity is enlarged by the effect of geometrical confinement of the plasma and shock wave. The result of cleaning tests using polystyrene particles demonstrates that the particle removal efficiency increases by the effect of geometrical confinement.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING-
dc.relation.isPartOfProceedings of SPIE-The International Society for Optical Engineering-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.titleEnhancement of cleaning efficiency by geometrical confinement of plasma expansion in the laser shock cleaning process for nanoscale contaminant removal-
dc.typeArticle-
dc.contributor.college기계공학과en_US
dc.identifier.doi10.1117/12.813629-
dc.author.googleJang, Den_US
dc.author.googleOh, JHen_US
dc.author.googleKim, Den_US
dc.author.googleLee, JMen_US
dc.relation.volume7201en_US
dc.contributor.id10103614en_US
dc.relation.journalProceedings of SPIE-The International Society for Optical Engineeringen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.collections.nameConference Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationProceedings of SPIE-The International Society for Optical Engineering, v.7201-
dc.identifier.wosid000285743300015-
dc.date.tcdate2018-03-23-
dc.citation.titleProceedings of SPIE-The International Society for Optical Engineering-
dc.citation.volume7201-
dc.contributor.affiliatedAuthorKim, D-
dc.identifier.scopusid2-s2.0-65649130093-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.scptc0*
dc.date.scptcdate2018-10-274*
dc.type.docTypeProceedings Paper-
dc.subject.keywordPlusPARTICLE REMOVAL-
dc.subject.keywordPlusBREAKDOWN-
dc.subject.keywordPlusSURFACE-
dc.subject.keywordAuthorLaser cleaning-
dc.subject.keywordAuthorshock wave-
dc.subject.keywordAuthorconfined geometry-
dc.subject.keywordAuthorlaser induced breakdown-
dc.subject.keywordAuthorpressure amplification-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryOptics-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaOptics-
dc.relation.journalResearchAreaPhysics-

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김동식KIM, DONGSIK
Dept of Mechanical Enginrg
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