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Cited 6 time in webofscience Cited 6 time in scopus
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dc.contributor.authorKang, B-
dc.contributor.authorLee, WH-
dc.contributor.authorChoi, HH-
dc.contributor.authorPark, YD-
dc.contributor.authorCho, K-
dc.date.accessioned2015-06-25T03:32:26Z-
dc.date.available2015-06-25T03:32:26Z-
dc.date.created2015-02-04-
dc.date.issued2014-01-
dc.identifier.issn2046-2069-
dc.identifier.other2015-OAK-0000031114en_US
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/12862-
dc.description.abstractWe systematically investigated the effects of a self-assembled monolayer (SAM), prepared on the gate dielectric, on the performances of bottom-gate organic field-effect transistor (OFET) devices under various humid environments. OFETs prepared with gate dielectrics modified by depositing a hydrophilic SAM display large variations in their carrier mobilities and on/off ratios when operated under dry or humid conditions. By contrast, the performances of OFETs with a hydrophobic SAM remain relatively constant, regardless of the humidity level. The stability conveyed by the hydrophobic SAM in the presence of humidity is closely related to the water resistance of the SAM, which is based on the hydrophilic and hydrophobic characteristics of the modified gate dielectric.-
dc.description.statementofresponsibilityopenen_US
dc.languageEnglish-
dc.publisherROYAL SOC CHEMISTRY-
dc.relation.isPartOfRSC ADVANCES-
dc.rightsBY_NC_NDen_US
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/kren_US
dc.subjectFIELD-EFFECT TRANSISTORS-
dc.subjectHUMIDITY SENSORS-
dc.subjectDIELECTRICS-
dc.subjectGROWTH-
dc.subjectEVAPORATION-
dc.subjectSTABILITY-
dc.subjectCRYSTALS-
dc.subjectENERGY-
dc.subjectFILMS-
dc.subjectAIR-
dc.titleBuilt-in water resistance in organic transistors modified with self-assembled monolayers-
dc.typeArticle-
dc.contributor.college화학공학과en_US
dc.identifier.doi10.1039/C4RA07227H-
dc.author.googleKang, Ben_US
dc.author.googleLee, WHen_US
dc.author.googleCho, Ken_US
dc.author.googlePark, YDen_US
dc.author.googleChoi, HHen_US
dc.relation.volume4en_US
dc.relation.issue85en_US
dc.relation.startpage45082en_US
dc.relation.lastpage45087en_US
dc.contributor.id10077904en_US
dc.relation.journalRSC ADVANCESen_US
dc.relation.indexSCI급, SCOPUS 등재논문en_US
dc.relation.sciSCIEen_US
dc.collections.nameJournal Papersen_US
dc.type.rimsART-
dc.identifier.bibliographicCitationRSC ADVANCES, v.4, no.85, pp.45082 - 45087-
dc.identifier.wosid000342993500028-
dc.date.tcdate2019-01-01-
dc.citation.endPage45087-
dc.citation.number85-
dc.citation.startPage45082-
dc.citation.titleRSC ADVANCES-
dc.citation.volume4-
dc.contributor.affiliatedAuthorCho, K-
dc.identifier.scopusid2-s2.0-84907552356-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc1-
dc.description.scptc1*
dc.date.scptcdate2018-10-274*
dc.type.docTypeArticle-
dc.subject.keywordPlusFIELD-EFFECT TRANSISTORS-
dc.subject.keywordPlusDIELECTRICS-
dc.subject.keywordPlusSTABILITY-
dc.subject.keywordPlusCRYSTALS-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusENERGY-
dc.subject.keywordPlusAIR-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-

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조길원CHO, KIL WON
Dept. of Chemical Enginrg
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