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Cited 38 time in webofscience Cited 44 time in scopus
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dc.contributor.authorH. Wk. Lee-
dc.contributor.authorKang, SK-
dc.contributor.authorWon, IH-
dc.contributor.authorKim, HY-
dc.contributor.authorKwon, HC-
dc.contributor.authorSim, JY-
dc.contributor.authorLEE, JAE KOO-
dc.date.accessioned2016-03-31T08:19:32Z-
dc.date.available2016-03-31T08:19:32Z-
dc.date.created2014-02-10-
dc.date.issued2013-12-
dc.identifier.issn1070-664X-
dc.identifier.other2013-OAK-0000028766-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/15054-
dc.description.abstractDistinctive discharge formation in atmospheric Ar and He plasmas was observed in the microwave frequency band using coaxial transmission line resonators. Ar plasmas formed a plasma plume whereas He formed only confined plasmas. As the frequency increased from 0.9 GHz to 2.45 GHz, the Ar plasma exhibited contraction and filamentation, and the He plasmas were constricted. Various powers and gas flow rates were applied to identify the effect of the electric field and gas flow rate on plasma plume formation. The He plasmas were more strongly affected by the electric field than the Ar plasmas. The breakdown and sustain powers yielded opposite results from those for low-frequency plasmas (similar to kHz). The phenomena could be explained by a change in the dominant ionization process with increasing frequency. Penning ionization and the contribution of secondary electrons in sheath region reduced as the frequency increased, leading to less efficient ionization of He because its ionization and excitation energies are higher than those of Ar. The emission spectra showed an increase in the NO and N-2 second positive band in both the Ar and He plasmas with increasing frequency whereas the hydroxyl radical and atomic O peaks did not increase with increasing frequency but were highest at particular frequencies. Further, the frequency effect of properties such as the plasma impedance, electron density, and device efficiency were presented. The study is expected to be helpful for determining the optimal conditions of plasma systems for biomedical applications. (C) 2013 AIP Publishing LLC.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherAIP-
dc.relation.isPartOfPHYSICS OF PLASMAS-
dc.titleDistinctive plume formation in atmospheric pressure Ar and He plasmas in microwave frequency band and suitability for biomedical applications-
dc.typeArticle-
dc.contributor.college전자전기공학과-
dc.identifier.doi10.1063/1.4841295-
dc.author.googleLee, HW-
dc.author.googleKang, SK-
dc.author.googleWon, IH-
dc.author.googleKim, HY-
dc.author.googleKwon, HC-
dc.author.googleSim, JY-
dc.author.googleLee, JK-
dc.relation.volume20-
dc.relation.issue12-
dc.contributor.id10158178-
dc.relation.journalPHYSICS OF PLASMAS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationPHYSICS OF PLASMAS, v.20, no.12-
dc.identifier.wosid000329176800076-
dc.date.tcdate2019-01-01-
dc.citation.number12-
dc.citation.titlePHYSICS OF PLASMAS-
dc.citation.volume20-
dc.contributor.affiliatedAuthorSim, JY-
dc.contributor.affiliatedAuthorLEE, JAE KOO-
dc.identifier.scopusid2-s2.0-84891720499-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc17-
dc.description.scptc10*
dc.date.scptcdate2018-05-121*
dc.type.docTypeArticle-
dc.relation.journalWebOfScienceCategoryPhysics, Fluids & Plasmas-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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심재윤SIM, JAE YOON
Dept of Electrical Enginrg
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