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Cited 55 time in webofscience Cited 53 time in scopus
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dc.contributor.authorSon, M-
dc.contributor.authorLiu, X-
dc.contributor.authorSadaf, SM-
dc.contributor.authorLee, D-
dc.contributor.authorPark, S-
dc.contributor.authorLee, W-
dc.contributor.authorKim, S-
dc.contributor.authorPark, J-
dc.contributor.authorShin, J-
dc.contributor.authorJung, S-
dc.contributor.authorHam, MH-
dc.contributor.authorHwang, H-
dc.date.accessioned2016-03-31T08:40:53Z-
dc.date.available2016-03-31T08:40:53Z-
dc.date.created2013-03-08-
dc.date.issued2012-05-
dc.identifier.issn0741-3106-
dc.identifier.other2012-OAK-0000027038-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/15811-
dc.description.abstractWe herein present a hybrid-type memory device in which threshold switching and bipolar resistive switching are combined. The nanoscale vanadium oxide (VOx) device simultaneously exhibited self-selective performance and memory switching by electroforming. By using W instead of Pt for the top electrode, memory performance was improved in terms of cycling, pulse endurance, and retention properties attributed to a self-formed WOx/VOx interface. Such a phenomenon in a simple metal-oxide-metal structure provides a good potential for future high-density cross-point memory devices by avoiding the sneak-path problem.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherInstitute of Electrical and Electronics Engineers Inc..-
dc.relation.isPartOfIEEE ELECTRON DEVICE LETTERS-
dc.subjectResistive random access memory (ReRAM)-
dc.subjectselection property-
dc.subjectvanadium oxide (VOx) nanoscale device-
dc.subjectRESISTIVE SWITCHING MEMORIES-
dc.subjectMETAL-INSULATOR-TRANSITION-
dc.titleSelf-selective Characteristics of Nanoscale VOx Devices for High-density ReRAM Applications-
dc.typeArticle-
dc.contributor.college신소재공학과-
dc.identifier.doi10.1109/LED.2012.2188989-
dc.author.googleSon, M-
dc.author.googleLiu, X-
dc.author.googleSadaf, SM-
dc.author.googleLee, D-
dc.author.googlePark, S-
dc.author.googleLee, W-
dc.author.googleKim, S-
dc.author.googlePark, J-
dc.author.googleShin, J-
dc.author.googleJung, S-
dc.author.googleHam, MH-
dc.author.googleHwang, H-
dc.relation.volume33-
dc.relation.issue5-
dc.relation.startpage718-
dc.relation.lastpage720-
dc.contributor.id10079928-
dc.relation.journalIEEE ELECTRON DEVICE LETTERS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationIEEE ELECTRON DEVICE LETTERS, v.33, no.5, pp.718 - 720-
dc.identifier.wosid000303322500030-
dc.date.tcdate2019-01-01-
dc.citation.endPage720-
dc.citation.number5-
dc.citation.startPage718-
dc.citation.titleIEEE ELECTRON DEVICE LETTERS-
dc.citation.volume33-
dc.contributor.affiliatedAuthorHwang, H-
dc.identifier.scopusid2-s2.0-84860382445-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc29-
dc.description.scptc32*
dc.date.scptcdate2018-05-121*
dc.type.docTypeArticle-
dc.subject.keywordAuthorResistive random access memory (ReRAM)-
dc.subject.keywordAuthorselection property-
dc.subject.keywordAuthorvanadium oxide (VOx) nanoscale device-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-

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황현상HWANG, HYUNSANG
Dept of Materials Science & Enginrg
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