Chemical development of preceramic polyvinylsilazane photoresist for ceramic patterning
SCIE
SCOPUS
- Title
- Chemical development of preceramic polyvinylsilazane photoresist for ceramic patterning
- Authors
- Li, YH; Li, XD; Kim, DP
- Date Issued
- 2009-10
- Publisher
- SPRINGER
- Abstract
- In order to develop a preceramic photoresist for the fabrication of non-oxide SiCN ceramic microstructures by a mold-free photocuring shaping process, UV sensitive acrylate functional groups were successfully grafted onto the backbone of polyvinylsilazane by its reaction with ethyl-4-bromocrotonate via a high efficiency allyl bromide electrophilic substitution process. The as-modified polymer was characterized by H-1 Nuclear Magnetic Resonance (H-1-NMR) and 2D-H-1-H-1-NMR (COSY) spectroscopy, and its UV sensitivity was investigated by Differential PhotoCalorimetry (DPC) and Fourier Transform InfraRed (FT-IR) spectroscopy. The reaction mechanism was discussed in detail and the results showed that the as-modified polyvinylsilazane (m-PVSZ) is a promising preceramic photoresist.
- Keywords
- Preceramic polymer; Polyvinylsilazane; Modification; UV sensitivity; MEMS; FABRICATION; COATINGS; POLYMER
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/16064
- DOI
- 10.1007/s10832-007-9331-z
- ISSN
- 1385-3449
- Article Type
- Article
- Citation
- JOURNAL OF ELECTROCERAMICS, vol. 23, no. 2-3, page. 133 - 136, 2009-10
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