Structural and Electrical Properties of Nitrogen Ion Implanted ZnO Nanorods
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- Title
- Structural and Electrical Properties of Nitrogen Ion Implanted ZnO Nanorods
- Authors
- Kwak, CH; Lee, YB; Seo, SY; Kim, SH; Park, CI; Kim, BH; Jeong, DW; Kim, JJ; Jin, Z; Han, SW
- Date Issued
- 2011-05
- Publisher
- ELSEVIER
- Abstract
- This study examined the micro-structural and electrical properties of nitrogen-ion implanted ZnO nanorods. Nitrogen ions (N(+)s) with energy of 50 keV and beam flux of 10(16) particles/cm(2) were implanted on vertically-aligned ZnO nanorods. Energy dispersive X-ray spectroscopy measurements showed that N(+)s were spread uniformly over the nanorods. Extended X-ray absorption fine structure (EXAFS) measurements suggested that the implanted N(+)s had partially substituted for the oxygen sites. The I-V characteristic curves showed that the N+-implanted nanorods were n-type. Moreover, annealing at 800 degrees C enhanced the charge carrier density in the nanorods by 10-fold, compared to the N+-implanted and unannealed ZnO nanorods. (C) 2010 Elsevier B.V. All rights reserved.
- Keywords
- ZnO; Nanorod; Ion implantation; Structure; I-V; EXAFS; ABSORPTION FINE-STRUCTURE; OPTICAL-PROPERTIES; NANOSTRUCTURES
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/16532
- DOI
- 10.1016/J.CAP.2010.11.068
- ISSN
- 1567-1739
- Article Type
- Article
- Citation
- CURRENT APPLIED PHYSICS, vol. 11, no. 3, page. 328 - 332, 2011-05
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- There are no files associated with this item.
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