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Enhanced oxidation of Ge(111) surface precovered with Na: scanning tunneling microscopy and X-ray photoemission spectroscopy study SCIE SCOPUS

Title
Enhanced oxidation of Ge(111) surface precovered with Na: scanning tunneling microscopy and X-ray photoemission spectroscopy study
Authors
Jeon, DSakurai, TLee, KDChung, JW
Date Issued
2004-06-20
Publisher
ELSEVIER SCIENCE BV
Abstract
We have studied the enhanced oxidation of the Ge(111) surface predeposited with Na. The surface morphology during the oxidation was studied using scanning tunneling microscopy (STM) and the surface chemical change at the early stage of oxidation was investigated using X-ray photoemission spectroscopy (XPS). Our microscopic data revealed that, on the clean surface, the oxidation was initiated at the grain boundaries and defects. When Na was deposited, tunneling images obtained as a function of oxygen dosage showed that the initial oxidation occurred also at the Na-cluster adsorption sites and then expanded laterally. The observed surface morphology agreed with XPS measurements, which showed the formation of Na-O, compound at the early stage of oxygen dosing. Our results suggested that the role of Na adsorbates in the enhanced oxidation was to provide additional oxidation sites. Upon annealing the oxidized surface, the oxygen photoemission peak associated with the Na-O compound faded away with the drastic change in the surface morphology. (C) 2004 Elsevier B.V. All rights reserved.
Keywords
germanium; semiconducting surfaces; oxidation; alkali metals; scanning tunneling microscopy; X-ray photoelectron spectroscopy; surface chemical reaction; SI(111)7X7 SURFACE; PROMOTED OXIDATION; SEMICONDUCTORS; ADSORPTION; OXYGEN; CS; SI(100); SILICON; CESIUM
URI
https://oasis.postech.ac.kr/handle/2014.oak/17858
DOI
10.1016/J.SUSC.2004.
ISSN
0039-6028
Article Type
Article
Citation
SURFACE SCIENCE, vol. 559, no. 2-3, page. 141 - 148, 2004-06-20
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