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Cited 10 time in webofscience Cited 68 time in scopus
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dc.contributor.authorKim, JK-
dc.contributor.authorLee, JL-
dc.date.accessioned2016-03-31T12:54:41Z-
dc.date.available2016-03-31T12:54:41Z-
dc.date.created2009-02-28-
dc.date.issued2003-03-
dc.identifier.issn0013-4651-
dc.identifier.other2003-OAK-0000003207-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/18680-
dc.description.abstractThe chemical bonding state and atomic composition at the surface of p-type GaN were studied by synchrotron radiation photo-emission spectroscopy. Ga-related oxides existed even after surface treatment using HCl solution, causing pinning of the surface Fermi level (E-F) at 0.62 eV above valence band maximum (E-V). Meanwhile, aqua regia treatment is effective in removing the surface oxide, resulting in the movement of the Fermi level toward E-V (E-F - E-V = 0.30 eV). This resulted from the existence of Ga vacancies underneath the surface oxide. As a result, the slope in the plot of Schottky barrier height with the metal work function was increased. (C) 2003 The Electrochemical Society.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherELECTROCHEMICAL SOC INC-
dc.relation.isPartOfJOURNAL OF THE ELECTROCHEMICAL SOCIETY-
dc.titleEffect of surface treatment on Schottky barrier height of p-type GaN-
dc.typeArticle-
dc.contributor.college신소재공학과-
dc.identifier.doi10.1149/1.1544637-
dc.author.googleKim, JK-
dc.author.googleLee, JL-
dc.relation.volume150-
dc.relation.issue3-
dc.contributor.id10105416-
dc.relation.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETY-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.150, no.3, pp.G209 - G211-
dc.identifier.wosid000181093600065-
dc.date.tcdate2019-01-01-
dc.citation.endPageG211-
dc.citation.number3-
dc.citation.startPageG209-
dc.citation.titleJOURNAL OF THE ELECTROCHEMICAL SOCIETY-
dc.citation.volume150-
dc.contributor.affiliatedAuthorKim, JK-
dc.contributor.affiliatedAuthorLee, JL-
dc.identifier.scopusid2-s2.0-0037348920-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc8-
dc.description.scptc51*
dc.date.scptcdate2018-05-121*
dc.type.docTypeArticle-
dc.relation.journalWebOfScienceCategoryElectrochemistry-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaElectrochemistry-
dc.relation.journalResearchAreaMaterials Science-

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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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