DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, JK | - |
dc.contributor.author | Jang, HW | - |
dc.contributor.author | Jeon, CM | - |
dc.contributor.author | Lee, JL | - |
dc.date.accessioned | 2016-03-31T12:57:47Z | - |
dc.date.available | 2016-03-31T12:57:47Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2002-12-09 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.other | 2002-OAK-0000003046 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/18797 | - |
dc.description.abstract | Iridium oxide (IrO2) was used as the Schottky barrier materials of GaN metal-semiconductor-metal (MSM) ultraviolet photodetector. Annealing an Ir contact at 500 degreesC under O-2 ambient, the reverse leakage current density at -5 V reduced by the four orders of magnitude, to similar to10(-6) A/cm(2). Simultaneously, Schottky barrier height and optical transmittance increased to 1.48 eV and 74.8% at 360 nm, respectively. The dramatic improvement originated from the formation of IrO2 by the annealing, resulting in the increase in the responsivity of the GaN MSM photodetector by one order of magnitude, in comparison with the photodetector with Pt Schottky contact. (C) 2002 American Institute of Physics. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.relation.isPartOf | APPLIED PHYSICS LETTERS | - |
dc.title | GaN metal-semiconductor-metal ultraviolet photodetector with IrO2 Schottky contact | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | - |
dc.identifier.doi | 10.1063/1.1524035 | - |
dc.author.google | Kim, JK | - |
dc.author.google | Jang, HW | - |
dc.author.google | Jeon, CM | - |
dc.author.google | Lee, JL | - |
dc.relation.volume | 81 | - |
dc.relation.issue | 24 | - |
dc.relation.startpage | 4655 | - |
dc.relation.lastpage | 4657 | - |
dc.contributor.id | 10105416 | - |
dc.relation.journal | APPLIED PHYSICS LETTERS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.81, no.24, pp.4655 - 4657 | - |
dc.identifier.wosid | 000179611800053 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 4657 | - |
dc.citation.number | 24 | - |
dc.citation.startPage | 4655 | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 81 | - |
dc.contributor.affiliatedAuthor | Kim, JK | - |
dc.contributor.affiliatedAuthor | Lee, JL | - |
dc.identifier.scopusid | 2-s2.0-0037049687 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 42 | - |
dc.description.scptc | 46 | * |
dc.date.scptcdate | 2018-05-121 | * |
dc.type.docType | Article | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
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