Selective cleavage of functional groups in the functionalized organic monolayers by synchrotron soft X-rays

Abstract

Aminosilylated surface was treated with halide-substituted aromatic aldehydes, and the resulting molecular layers were examined with synchrotron X-ray photoelectron spectroscopy at the 2B1 SGM and 4B1 microscopy beamline in the Pohang Accelerator Laboratory. It was observed that the halide group of the film diminished upon the irradiation, but the other bands were constant in terms of the intensity and the shape. This observation indicates that the functional groups of the organic monolayers are cleaved selectively by soft X-rays. The cleavage rate was measured as a function of photon energy and normalized with photon flux. The cleavage is first-order to the concentration of the functional group. Its rate constant is sensitive to the molecular structure of the organic monolayers and the kind of substituents on the aromatic ring.