DC Field | Value | Language |
---|---|---|
dc.contributor.author | Doh, SJ | - |
dc.contributor.author | Je, JH | - |
dc.contributor.author | Cho, TS | - |
dc.date.accessioned | 2016-03-31T13:05:44Z | - |
dc.date.available | 2016-03-31T13:05:44Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2002-05 | - |
dc.identifier.issn | 0022-0248 | - |
dc.identifier.other | 2002-OAK-0000002669 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/19059 | - |
dc.description.abstract | In situ crystallization of alpha-Fe2O3/alpha-Al2O3(0 0 0 1) thin films was studied in real-time synchrotron X-ray scattering experiments. We find the coexistence of alpha-Fe2O3 (hexagonal) and Fe3O4 (cubic) interfacial crystallites (similar to50-Angstrom-thick), well aligned [0.02degrees full-width at half-maximum (FWHM)] to the alpha-Al2O3[0001] direction, in the sputter-grown amorphous films. As the annealing temperature increases up to 750 degreesC, the cubic stacking of the Fe3O4 crystallites gradually changes to the hexagonal alpha-Fe2O3 stacking, together with the growth of the well-aligned (WA) (0.02 FWHM) grains from the alpha-Fe2O3 crystallites. In the meanwhile, heterogeneous nucleation starts to occur on the substrate at similar to600degreesC, resulting in the formation of misaligned (1.39degrees FWHM) alpha-Fe2O3 grains. Our study reveals that the interfacial crystallites act as a template for the growth of the WA alpha-Fe2O3 grains. (C) 2002 Published by Elsevier Science B.V. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.relation.isPartOf | JOURNAL OF CRYSTAL GROWTH | - |
dc.subject | crystallites | - |
dc.subject | interfaces | - |
dc.subject | nucleation | - |
dc.subject | MOLECULAR-BEAM EPITAXY | - |
dc.subject | IRON-OXIDE FILMS | - |
dc.subject | ALPHA-FE2O3 | - |
dc.subject | GROWTH | - |
dc.title | Role of interfacial crystallites in the crystallization of alpha-FeA/alpha-Al2O3(0001) thin films | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | - |
dc.identifier.doi | 10.1016/S0022-0248(02)00908-9 | - |
dc.author.google | Doh, SJ | - |
dc.author.google | Je, JH | - |
dc.author.google | Cho, TS | - |
dc.relation.volume | 240 | - |
dc.relation.issue | 3-4 | - |
dc.relation.startpage | 355 | - |
dc.relation.lastpage | 362 | - |
dc.contributor.id | 10123980 | - |
dc.relation.journal | JOURNAL OF CRYSTAL GROWTH | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | JOURNAL OF CRYSTAL GROWTH, v.240, no.3-4, pp.355 - 362 | - |
dc.identifier.wosid | 000175912000004 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 362 | - |
dc.citation.number | 3-4 | - |
dc.citation.startPage | 355 | - |
dc.citation.title | JOURNAL OF CRYSTAL GROWTH | - |
dc.citation.volume | 240 | - |
dc.contributor.affiliatedAuthor | Je, JH | - |
dc.identifier.scopusid | 2-s2.0-0036571239 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 4 | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | MOLECULAR-BEAM EPITAXY | - |
dc.subject.keywordPlus | IRON-OXIDE FILMS | - |
dc.subject.keywordPlus | ALPHA-FE2O3 | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordAuthor | crystallites | - |
dc.subject.keywordAuthor | interfaces | - |
dc.subject.keywordAuthor | nucleation | - |
dc.relation.journalWebOfScienceCategory | Crystallography | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Crystallography | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
library@postech.ac.kr Tel: 054-279-2548
Copyrights © by 2017 Pohang University of Science ad Technology All right reserved.