Particle-in-cell simulation of a neutral beam source for materials processing
SCIE
SCOPUS
- Title
- Particle-in-cell simulation of a neutral beam source for materials processing
- Authors
- Hur, MS; Kim, SJ; Lee, HS; Lee, JK; Yeom, GY
- Date Issued
- 2002-02
- Publisher
- IEEE-INST ELECTRICAL ELECTRONICS ENGI
- Abstract
- Neutral beam processing is being considered as a new technique to reduce plasma-induced damage in materials processing. We report on particle-in-cell simulations of a neutral beam source. The system is composed of an ion-beam source and multireflectors which neutralize incident ions and reflect neutral particles. It is revealed from the simulations that about 2.8% of the ion-current from an ion-beam source is successfully neutralized before reaching a diagnostic plate.
- Keywords
- neutral beam source; particle-in-cell simulation; plasma materials processing
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/19070
- DOI
- 10.1109/TPS.2002.1003948
- ISSN
- 0093-3813
- Article Type
- Article
- Citation
- IEEE TRANSACTIONS ON PLASMA SCIENCE, vol. 30, no. 1, page. 110 - 111, 2002-02
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- There are no files associated with this item.
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