DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, JK | - |
dc.contributor.author | Jang, HW | - |
dc.contributor.author | Lee, JL | - |
dc.date.accessioned | 2016-03-31T13:06:18Z | - |
dc.date.available | 2016-03-31T13:06:18Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2002-06-01 | - |
dc.identifier.issn | 0021-8979 | - |
dc.identifier.other | 2002-OAK-0000002643 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/19080 | - |
dc.description.abstract | Changes of the work function of contact metal and the atomic composition at the vicinity of metal/GaN interface were studied in in situ annealed Ti on n-type GaN using synchrotron radiation photoemission spectroscopy. Ti layer transformed to TiN and its work function increased as annealing temperature increased. Meanwhile, the atomic composition ratio of Ga-to-N below the TiN contact increased indicating the creation of N vacancies. This provides evidence that N vacancies produced below the contact, acting as donors for electrons, play a main role in forming the Ohmic contact. (C) 2002 American Institute of Physics. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.relation.isPartOf | JOURNAL OF APPLIED PHYSICS | - |
dc.title | Mechanism for Ohmic contact formation of Ti on n-type GaN investigated using synchrotron radiation photoemission spectroscopy | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | - |
dc.identifier.doi | 10.1063/1.1476085 | - |
dc.author.google | Kim, JK | - |
dc.author.google | Jang, HW | - |
dc.author.google | Lee, JL | - |
dc.relation.volume | 91 | - |
dc.relation.issue | 11 | - |
dc.relation.startpage | 9214 | - |
dc.relation.lastpage | 9217 | - |
dc.contributor.id | 10105416 | - |
dc.relation.journal | JOURNAL OF APPLIED PHYSICS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | JOURNAL OF APPLIED PHYSICS, v.91, no.11, pp.9214 - 9217 | - |
dc.identifier.wosid | 000175708900041 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 9217 | - |
dc.citation.number | 11 | - |
dc.citation.startPage | 9214 | - |
dc.citation.title | JOURNAL OF APPLIED PHYSICS | - |
dc.citation.volume | 91 | - |
dc.contributor.affiliatedAuthor | Kim, JK | - |
dc.contributor.affiliatedAuthor | Lee, JL | - |
dc.identifier.scopusid | 2-s2.0-0036607903 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 42 | - |
dc.description.scptc | 43 | * |
dc.date.scptcdate | 2018-05-121 | * |
dc.type.docType | Article | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
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