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Cited 258 time in webofscience Cited 274 time in scopus
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dc.contributor.authorChon, U-
dc.contributor.authorKim, KB-
dc.contributor.authorJang, HM-
dc.contributor.authorYi, GC-
dc.date.accessioned2016-03-31T13:12:56Z-
dc.date.available2016-03-31T13:12:56Z-
dc.date.created2009-02-28-
dc.date.issued2001-11-05-
dc.identifier.issn0003-6951-
dc.identifier.other2001-OAK-0000002301-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/19326-
dc.description.abstractFatigue-free and highly c-axis oriented Bi3.15Sm0.85Ti3O12 (BSmT) thin films were grown on Pt/TiO2/SiO2/Si(100) substrates using the method of metalorganic sol decomposition. The BSmT film capacitor with a top Pt electrode showed significantly improved values of the remanent polarization (2P(r)) and the nonvolatile charge as compared to those of the Bi4-xLaxTi3O12 (x=0.75) film capacitor, recently known as the most promising candidate for nonvolatile memories. The 2P(r) value of the BSmT capacitor was 49 muC/cm(2) at an applied voltage of 10 V while the net nonvolatile switching charge was as high as 20 muC/cm(2) and remained essentially constant up to 4.5x10(10) read/write switching cycles at a frequency of 1 MHz. In addition to these, the capacitor demonstrated excellent charge-retention characteristics with its sensing margin of 17 muC/cm(2) and a strong resistance against the imprinting failure. (C) 2001 American Institute of Physics.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.titleFatigue-free samarium-modified bismuth titanate (Bi4-xSmxTi3O12) film capacitors having large spontaneous polarizations-
dc.typeArticle-
dc.contributor.college신소재공학과-
dc.identifier.doi10.1063/1.1415353-
dc.author.googleChon, U-
dc.author.googleKim, KB-
dc.author.googleJang, HM-
dc.author.googleYi, GC-
dc.relation.volume79-
dc.relation.issue19-
dc.relation.startpage3137-
dc.relation.lastpage3139-
dc.contributor.id10084272-
dc.relation.journalAPPLIED PHYSICS LETTERS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.79, no.19, pp.3137 - 3139-
dc.identifier.wosid000171896600041-
dc.date.tcdate2019-01-01-
dc.citation.endPage3139-
dc.citation.number19-
dc.citation.startPage3137-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume79-
dc.contributor.affiliatedAuthorJang, HM-
dc.contributor.affiliatedAuthorYi, GC-
dc.identifier.scopusid2-s2.0-0000183165-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc238-
dc.type.docTypeArticle-
dc.subject.keywordPlusFERROELECTRIC CAPACITORS-
dc.subject.keywordPlusELECTRICAL-PROPERTIES-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusHETEROSTRUCTURES-
dc.subject.keywordPlusRETENTION-
dc.subject.keywordPlusMEMORIES-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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장현명JANG, HYUN MYUNG
Div of Advanced Materials Science
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