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Cited 57 time in webofscience Cited 67 time in scopus
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dc.contributor.authorPark, WI-
dc.contributor.authorYi, GC-
dc.date.accessioned2016-03-31T13:13:30Z-
dc.date.available2016-03-31T13:13:30Z-
dc.date.created2009-02-28-
dc.date.issued2001-10-
dc.identifier.issn0361-5235-
dc.identifier.other2001-OAK-0000002270-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/19347-
dc.description.abstractWe report on the photoluminescent (PL) properties of ZnO thin films grown on SiO2/Si(100) substrates using low pressure metal-organic chemical vapor deposition. The growth temperature of the films was as low as 400 degreesC. From the PL spectra of the films at 10-300 K, strong PL peaks due to fi-ee and bound excitons were observed. The origin of the near bandedge emission peaks was investigated measuring temperature-dependent PL spectra. In addition, the ZnO films demonstrated a stimulated emission peak at room temperature. Upon illumination with an excitation density of 1 MW/cm(2), a strong, sharp peak was observed at 3.181 eV.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherMINERALS METALS MATERIALS SOC-
dc.relation.isPartOfJOURNAL OF ELECTRONIC MATERIALS-
dc.subjectZnO-
dc.subjectmetal organic chemical vapor deposition (MOCVD)-
dc.subjectphotoluminescence-
dc.subjectSiO2/Si substrate-
dc.subjectstimulated emission-
dc.titlePhotoluminescent properties of ZnO thin films grown on SiO2/Si(100) by metal-organic chemical vapor deposition-
dc.typeArticle-
dc.contributor.college신소재공학과-
dc.identifier.doi10.1007/s11664-001-0127-7-
dc.author.googlePark, WI-
dc.author.googleYi, GC-
dc.relation.volume30-
dc.relation.issue10-
dc.relation.journalJOURNAL OF ELECTRONIC MATERIALS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationJOURNAL OF ELECTRONIC MATERIALS, v.30, no.10, pp.L32 - L35-
dc.identifier.wosid000171658300017-
dc.date.tcdate2019-01-01-
dc.citation.endPageL35-
dc.citation.number10-
dc.citation.startPageL32-
dc.citation.titleJOURNAL OF ELECTRONIC MATERIALS-
dc.citation.volume30-
dc.contributor.affiliatedAuthorYi, GC-
dc.identifier.scopusid2-s2.0-0035484333-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc46-
dc.type.docTypeArticle-
dc.subject.keywordAuthorZnO-
dc.subject.keywordAuthormetal organic chemical vapor deposition (MOCVD)-
dc.subject.keywordAuthorphotoluminescence-
dc.subject.keywordAuthorSiO2/Si substrate-
dc.subject.keywordAuthorstimulated emission-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-

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이규철YI, GYU CHUL
Dept of Materials Science & Enginrg
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