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Cited 206 time in webofscience Cited 226 time in scopus
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dc.contributor.authorKim, JK-
dc.contributor.authorLee, JL-
dc.contributor.authorLee, JW-
dc.contributor.authorShin, HE-
dc.contributor.authorPark, YJ-
dc.contributor.authorKim, T-
dc.date.accessioned2016-03-31T13:47:50Z-
dc.date.available2016-03-31T13:47:50Z-
dc.date.created2009-02-28-
dc.date.issued1998-11-16-
dc.identifier.issn0003-6951-
dc.identifier.other1998-OAK-0000000474-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/20603-
dc.description.abstractOhmic contact to p-type GaN with the lowest contact resistivity was developed by the surface treatment prior to Pd/Au metal deposition. The contact resistivity drastically decreased from 2.9 x 10(-2) to 4.3 x 10(-4) Ohm cm(2) by the surface treatment using aqua regia. The surface treatment plays a role in removing the surface oxide formed on p-type GaN during epitaxial growth, and subsequently in reducing the barrier height for holes at the interface of Pd/ p-type GaN, resulting in the good ohmic contacts to p-type GaN. (C) 1998 American Institute of Physics. [S0003-6951(98)01246-7].-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.titleLow resistance Pd/Au ohmic contacts to p-type GaN using surface treatment-
dc.typeArticle-
dc.contributor.college신소재공학과-
dc.identifier.doi10.1063/1.122641-
dc.author.googleKIM, JK-
dc.author.googleLEE, JL-
dc.author.googleLEE, JW-
dc.author.googleSHIN, HE-
dc.author.googlePARK, YJ-
dc.author.googleKIM, T-
dc.relation.volume73-
dc.relation.issue20-
dc.relation.startpage2953-
dc.relation.lastpage2955-
dc.contributor.id10105416-
dc.relation.journalAPPLIED PHYSICS LETTERS-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.73, no.20, pp.2953 - 2955-
dc.identifier.wosid000076848700033-
dc.date.tcdate2019-01-01-
dc.citation.endPage2955-
dc.citation.number20-
dc.citation.startPage2953-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume73-
dc.contributor.affiliatedAuthorKim, JK-
dc.contributor.affiliatedAuthorLee, JL-
dc.identifier.scopusid2-s2.0-0001387374-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc189-
dc.type.docTypeArticle-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-

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이종람LEE, JONG LAM
Dept of Materials Science & Enginrg
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