DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, JK | - |
dc.contributor.author | Lee, JL | - |
dc.contributor.author | Lee, JW | - |
dc.contributor.author | Shin, HE | - |
dc.contributor.author | Park, YJ | - |
dc.contributor.author | Kim, T | - |
dc.date.accessioned | 2016-03-31T13:47:50Z | - |
dc.date.available | 2016-03-31T13:47:50Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 1998-11-16 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.other | 1998-OAK-0000000474 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/20603 | - |
dc.description.abstract | Ohmic contact to p-type GaN with the lowest contact resistivity was developed by the surface treatment prior to Pd/Au metal deposition. The contact resistivity drastically decreased from 2.9 x 10(-2) to 4.3 x 10(-4) Ohm cm(2) by the surface treatment using aqua regia. The surface treatment plays a role in removing the surface oxide formed on p-type GaN during epitaxial growth, and subsequently in reducing the barrier height for holes at the interface of Pd/ p-type GaN, resulting in the good ohmic contacts to p-type GaN. (C) 1998 American Institute of Physics. [S0003-6951(98)01246-7]. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.relation.isPartOf | APPLIED PHYSICS LETTERS | - |
dc.title | Low resistance Pd/Au ohmic contacts to p-type GaN using surface treatment | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | - |
dc.identifier.doi | 10.1063/1.122641 | - |
dc.author.google | KIM, JK | - |
dc.author.google | LEE, JL | - |
dc.author.google | LEE, JW | - |
dc.author.google | SHIN, HE | - |
dc.author.google | PARK, YJ | - |
dc.author.google | KIM, T | - |
dc.relation.volume | 73 | - |
dc.relation.issue | 20 | - |
dc.relation.startpage | 2953 | - |
dc.relation.lastpage | 2955 | - |
dc.contributor.id | 10105416 | - |
dc.relation.journal | APPLIED PHYSICS LETTERS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.73, no.20, pp.2953 - 2955 | - |
dc.identifier.wosid | 000076848700033 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 2955 | - |
dc.citation.number | 20 | - |
dc.citation.startPage | 2953 | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 73 | - |
dc.contributor.affiliatedAuthor | Kim, JK | - |
dc.contributor.affiliatedAuthor | Lee, JL | - |
dc.identifier.scopusid | 2-s2.0-0001387374 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 189 | - |
dc.type.docType | Article | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
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