Characterization of a multilayer soft X-ray reflector fabricated by pulsed laser deposition

Abstract

A Mo/Si multilayer (ML) has been fabricated as a reflector in the soft X-ray spectral region by pulsed laser deposition (PLD), using the second harmonic of Nd/YAG pulsed laser (5 ns, 532 nm light). The ML structure was characterized by transmission electron microscopy (TEM), small-angle X-ray scattering (SAXS) and photoelectron spectroscopy for chemical analysis (ESCA). The near-normal incidence reflectivity in the spectral range of 14-17 nm was measured using a soft X-ray reflectometer based on a laser-produced plasma. The structural parameters were evaluated by fitting to both the SAXS profile and the soft X-ray reflectance measurement with asymmetric interface profile, roughness and composition taken into account. (C) 1998 Elsevier Science B.V.