DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, YB | - |
dc.contributor.author | Rhee, SW | - |
dc.date.accessioned | 2016-03-31T14:01:10Z | - |
dc.date.available | 2016-03-31T14:01:10Z | - |
dc.date.created | 2009-03-16 | - |
dc.date.issued | 2001-03-15 | - |
dc.identifier.issn | 0257-8972 | - |
dc.identifier.other | 2001-OAK-0000010270 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/20999 | - |
dc.description.abstract | Exposing silicon nitride surfaces to hydrogen plasma prior to low temperature microcrystalline-si deposition is an effective way of modifying surfaces to improve wettability and surface cleanliness. Atomic force microscopy (AFM) and Auger electron spectroscopy (AES) showed a delicate change in the morphology and a clear increase in nucleation resulting from the modification and cleaning effect of the SiNx:H surface by H-2 plasma exposure. The surface roughness correlation function measured by AFM has been shown to be in good agreement with a simple model from which the roughness exponent and lateral sizes of mountains and valleys in the surface can be deduced. (C) 2001 Elsevier Science B.V. All rights reserved. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.relation.isPartOf | SURFACE & COATINGS TECHNOLOGY | - |
dc.subject | AFM | - |
dc.subject | scaling | - |
dc.subject | surface morphology | - |
dc.subject | hydrogen plasma | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | SCANNING-TUNNELING-MICROSCOPY | - |
dc.subject | SILICON FILMS | - |
dc.subject | ROUGHNESS | - |
dc.subject | GROWTH | - |
dc.subject | INSITU | - |
dc.title | AFM study of SINx : H surfaces treated by hydrogen plasma: modification of morphological and scaling characteristics | - |
dc.type | Article | - |
dc.contributor.college | 화학공학과 | - |
dc.identifier.doi | 10.1016/S0257-8972(00)01098-7 | - |
dc.author.google | Park, YB | - |
dc.author.google | Rhee, SW | - |
dc.relation.volume | 137 | - |
dc.relation.issue | 2-3 | - |
dc.relation.startpage | 265 | - |
dc.relation.lastpage | 269 | - |
dc.contributor.id | 10052631 | - |
dc.relation.journal | SURFACE & COATINGS TECHNOLOGY | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | SURFACE & COATINGS TECHNOLOGY, v.137, no.2-3, pp.265 - 269 | - |
dc.identifier.wosid | 000167084000024 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 269 | - |
dc.citation.number | 2-3 | - |
dc.citation.startPage | 265 | - |
dc.citation.title | SURFACE & COATINGS TECHNOLOGY | - |
dc.citation.volume | 137 | - |
dc.contributor.affiliatedAuthor | Rhee, SW | - |
dc.identifier.scopusid | 2-s2.0-35868333 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 9 | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | SCANNING-TUNNELING-MICROSCOPY | - |
dc.subject.keywordPlus | SILICON FILMS | - |
dc.subject.keywordPlus | ROUGHNESS | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordPlus | INSITU | - |
dc.subject.keywordAuthor | AFM | - |
dc.subject.keywordAuthor | scaling | - |
dc.subject.keywordAuthor | surface morphology | - |
dc.subject.keywordAuthor | hydrogen plasma | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
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