Effect of the nitrogen partial pressure on the preferred orientation of TiN thin films
SCIE
SCOPUS
- Title
- Effect of the nitrogen partial pressure on the preferred orientation of TiN thin films
- Authors
- Yang, HH; Je, JH; Lee, KB
- Date Issued
- 1995-12-01
- Publisher
- CHAPMAN HALL LTD
- Keywords
- STRAIN
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/21675
- DOI
- 10.1007/BF00422660
- ISSN
- 0261-8028
- Article Type
- Article
- Citation
- JOURNAL OF MATERIALS SCIENCE LETTERS, vol. 14, no. 23, page. 1635 - 1637, 1995-12-01
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- There are no files associated with this item.
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