DC Field | Value | Language |
---|---|---|
dc.contributor.author | PARK, HH | - |
dc.contributor.author | NAHM, S | - |
dc.contributor.author | SUH, KS | - |
dc.contributor.author | LEE, JL | - |
dc.contributor.author | CHO, KI | - |
dc.contributor.author | KIM, KS | - |
dc.contributor.author | PARK, SC | - |
dc.contributor.author | LEE, JS | - |
dc.contributor.author | LEE, YH | - |
dc.date.accessioned | 2016-03-31T14:28:04Z | - |
dc.date.available | 2016-03-31T14:28:04Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 1995-07 | - |
dc.identifier.issn | 0022-3093 | - |
dc.identifier.other | 1995-OAK-0000009191 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/21748 | - |
dc.description.abstract | The thermal behavior of antifusing device characteristic with SiO2/Ti0.1W0.9 system was investigated. Amelioration and destruction of device properties were found after annealing at 400 degrees C and 600 degrees C, respectively. Through in situ heat treatment at 400 degrees C, it was revealed that metallic tungsten was formed at the interface due to decomposition of WO3. Annealing above 600 degrees C induces decomposition of SiO2 and results in failure of the antifusing device characteristic. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.relation.isPartOf | JOURNAL OF NON-CRYSTALLINE SOLIDS | - |
dc.subject | GATE ARRAY APPLICATIONS | - |
dc.subject | ANTIFUSE STRUCTURE | - |
dc.title | INVESTIGATION ON THE INTERFACIAL REACTION OF SIO2/TI0.1W0.9 SYSTEM | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | - |
dc.identifier.doi | 10.1016/0022-3093(95)00128-X | - |
dc.author.google | CHO, KI | - |
dc.author.google | KIM, KS | - |
dc.author.google | LEE, JL | - |
dc.author.google | LEE, JS | - |
dc.author.google | LEE, YH | - |
dc.author.google | NAHM, S | - |
dc.author.google | PARK, HH | - |
dc.author.google | PARK, SC | - |
dc.author.google | SUH, KS | - |
dc.relation.volume | 187 | - |
dc.relation.startpage | 149 | - |
dc.relation.lastpage | 155 | - |
dc.contributor.id | 10105416 | - |
dc.relation.journal | JOURNAL OF NON-CRYSTALLINE SOLIDS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | JOURNAL OF NON-CRYSTALLINE SOLIDS, v.187, pp.149 - 155 | - |
dc.identifier.wosid | A1995RK19500027 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 155 | - |
dc.citation.startPage | 149 | - |
dc.citation.title | JOURNAL OF NON-CRYSTALLINE SOLIDS | - |
dc.citation.volume | 187 | - |
dc.contributor.affiliatedAuthor | LEE, JL | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 1 | - |
dc.type.docType | Article | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Ceramics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
library@postech.ac.kr Tel: 054-279-2548
Copyrights © by 2017 Pohang University of Science ad Technology All right reserved.