Enhancement of physical properties of indium tin oxide deposited by super density arc plasma ion plating by O-2 plasma treatment
SCIE
SCOPUS
- Title
- Enhancement of physical properties of indium tin oxide deposited by super density arc plasma ion plating by O-2 plasma treatment
- Authors
- Kim, SY; Hong, K; Lee, JL; Choi, KH; Song, KH; Ahn, KC
- Date Issued
- 2008-01
- Publisher
- PERGAMON-ELSEVIER SCIENCE LTD
- Abstract
- Indium tin oxide (ITO) films were deposited on glass by super density arc plasma ion plating (SDAP-IP) method. In X-ray diffraction profiles, no obvious changes were found after O-2 Plasma treatment. The transmittance, roughness, X-ray diffraction pattern, and sheet resistance also negligibly changed with O-2 plasma treatment. However, the water contact angle decreased with the O-2 plasma treatment, Suggesting the increase of cohesive force between SDAP-IP ITO and organic materials. Synchrotron radiation photoemission spectroscopy showed that O-2 plasma treatment resulted in an increase of SDAP-IP ITO work function. Incorporation of oxygen atoms near the SDAP-IP ITO surface during the O-2 plasma treatment induced a peroxidic ITO surface, increasing the work function. (C) 2007 Elsevier Ltd. All rights reserved.
- Keywords
- indium tin oxide; super density are plasma ion plating; O-2 plasma treatment; synchrotron radiation photoemission spectroscopy; work function; organic light emitting diode; LIGHT-EMITTING-DIODES; THIN-FILMS; PHOTOELECTRON-SPECTROSCOPY; HOLE INJECTION; WORK FUNCTION; PERFORMANCE; ITO; OXIDATION; LAYER
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/22967
- DOI
- 10.1016/j.sse.2007.07.037
- ISSN
- 0038-1101
- Article Type
- Article
- Citation
- SOLID-STATE ELECTRONICS, vol. 52, no. 1, page. 1 - 6, 2008-01
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- There are no files associated with this item.
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