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Cited 5 time in webofscience Cited 7 time in scopus
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dc.contributor.authorLee, SM-
dc.contributor.authorYang, SS-
dc.contributor.authorSeo, YS-
dc.contributor.authorLee, JK-
dc.date.accessioned2016-04-01T01:34:08Z-
dc.date.available2016-04-01T01:34:08Z-
dc.date.created2009-02-28-
dc.date.issued2007-08-
dc.identifier.issn0272-4324-
dc.identifier.other2007-OAK-0000007095-
dc.identifier.urihttps://oasis.postech.ac.kr/handle/2014.oak/23221-
dc.description.abstractThe sputtering of the MgO protective layer by energetic ions is one of the factors limiting the lifetime of the plasma display panels (PDPs). The sputtering profile of the MgO layer in a coplanar PDP cell has been studied using two-dimensional particle-in-cell Monte-Carlo Collision (PIC-MCC) simulations. The sputtering profile of the MgO layer for various gas conditions is obtained accounting for the energy and angle distributions of different ion species and their respective sputtering yields. Based on the simulation results, the MgO layer is more aggressively sputtered in Ne-based discharges than in He-based discharges. As a result, it is expected that the addition of He to the Ne-Xe mixture in PDPs will reduce the sputtering of the MgO layer and extend the lifetime of the PDP cells.-
dc.description.statementofresponsibilityX-
dc.languageEnglish-
dc.publisherSPRINGER-
dc.relation.isPartOfPLASMA CHEMISTRY AND PLASMA PROCESSING-
dc.subjectplasma display panel-
dc.subjectenergy and angle distributions-
dc.subjectMgO-
dc.subjecterosion-
dc.subjectPLASMA DISPLAY PANELS-
dc.subjectENERGY-DISTRIBUTION-
dc.subjectLAYER-
dc.titleMgO erosion profile in the high pressure coplanar discharge-
dc.typeArticle-
dc.contributor.college전자전기공학과-
dc.identifier.doi10.1007/s11090-007-9093-z-
dc.author.googleLee, SM-
dc.author.googleYang, SS-
dc.author.googleSeo, YS-
dc.author.googleLee, JK-
dc.relation.volume27-
dc.relation.issue4-
dc.relation.startpage349-
dc.relation.lastpage358-
dc.contributor.id10158178-
dc.relation.journalPLASMA CHEMISTRY AND PLASMA PROCESSING-
dc.relation.indexSCI급, SCOPUS 등재논문-
dc.relation.sciSCI-
dc.collections.nameJournal Papers-
dc.type.rimsART-
dc.identifier.bibliographicCitationPLASMA CHEMISTRY AND PLASMA PROCESSING, v.27, no.4, pp.349 - 358-
dc.identifier.wosid000248812500001-
dc.date.tcdate2019-01-01-
dc.citation.endPage358-
dc.citation.number4-
dc.citation.startPage349-
dc.citation.titlePLASMA CHEMISTRY AND PLASMA PROCESSING-
dc.citation.volume27-
dc.contributor.affiliatedAuthorLee, JK-
dc.identifier.scopusid2-s2.0-34547830257-
dc.description.journalClass1-
dc.description.journalClass1-
dc.description.wostc3-
dc.type.docTypeArticle-
dc.subject.keywordPlusENERGY-DISTRIBUTION-
dc.subject.keywordPlusDISPLAY-
dc.subject.keywordPlusLAYER-
dc.subject.keywordAuthorplasma display panel-
dc.subject.keywordAuthorenergy and angle distributions-
dc.subject.keywordAuthorMgO-
dc.subject.keywordAuthorerosion-
dc.relation.journalWebOfScienceCategoryEngineering, Chemical-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Fluids & Plasmas-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaPhysics-

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