Precise control of surface wettability of mixed monolayers using a simple wiping method

Abstract

To control the wettability of a silicon surface, mixed monolayers of 11-cyanoundecyltrichlorosilane (CN(CH2)(11)SiCl3) and dodecyltrichlorosilane (CH3(CH2)(11)SiCl3) in different ratios were fabricated using a simple wiping method. The surface of the wiped mixed monolayers was reproducibly homogeneous and smooth and the water wettability of wiped surfaces was controlled successfully with linear dependency, where the composition of the mixed monolayers matched the composition of the deposition solution in a direct 1: 1 fashion. From these results, the spread of the inkjet printed poly(3,4-ethylenedioxythiophene) doped with poly(styrene sulfonic acid) dots was controlled finely by the surface wettability of the wiped mixed monolayers. (c) 2006 Elsevier B.V. All rights reserved.