DC Field | Value | Language |
---|---|---|
dc.contributor.author | Cho, JH | - |
dc.contributor.author | Park, YD | - |
dc.contributor.author | Kim, DH | - |
dc.contributor.author | Kim, WK | - |
dc.contributor.author | Jang, HW | - |
dc.contributor.author | Lee, JL | - |
dc.contributor.author | Cho, KW | - |
dc.date.accessioned | 2016-04-01T01:59:05Z | - |
dc.date.available | 2016-04-01T01:59:05Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2006-03-06 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.other | 2006-OAK-0000005762 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/24149 | - |
dc.description.abstract | With the aim of improving the electrical and adhesion properties of the indium-tin-oxide (ITO) electrode/organic interface, we tested Cl- and CF3-terminated self-assembled monolayers (SAMs), which react with the indium atoms of the electrode, and compared the results to those obtained using a CH3-terminated SAM. The contact resistance of the interface between the Cl-terminated surface and the ITO electrode (1.5 k Omega) was found to be much lower than that of the interface between the ITO and the CF3-terminated surface (21.3 k Omega), which can be attributed to the higher dipole moment of the In-Cl complex compared to the In-F complex. In the ITO films deposited on the CH3-terminated surface, the contact resistance (138.0 k Omega) was much higher than those of the reactive metal contacts because the ITO thin film deposited on the CH3-terminated surface does not react with the SAM. (c) 2006 American Institute of Physics. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.relation.isPartOf | APPLIED PHYSICS LETTERS | - |
dc.title | Reactive metal contact at indium-tin-oxide/self-assembled monolayer interfaces | - |
dc.type | Article | - |
dc.contributor.college | 화학공학과 | - |
dc.identifier.doi | 10.1063/1.2183371 | - |
dc.author.google | Cho, JH | - |
dc.author.google | Park, YD | - |
dc.author.google | Kim, DH | - |
dc.author.google | Kim, WK | - |
dc.author.google | Jang, HW | - |
dc.author.google | Lee, JL | - |
dc.author.google | Cho, KW | - |
dc.relation.volume | 88 | - |
dc.relation.issue | 10 | - |
dc.relation.startpage | 102104 | - |
dc.relation.lastpage | 102104 | - |
dc.contributor.id | 10077904 | - |
dc.relation.journal | APPLIED PHYSICS LETTERS | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.88, no.10 | - |
dc.identifier.wosid | 000235905800040 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.number | 10 | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 88 | - |
dc.contributor.affiliatedAuthor | Lee, JL | - |
dc.contributor.affiliatedAuthor | Cho, KW | - |
dc.identifier.scopusid | 2-s2.0-33644902070 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 12 | - |
dc.description.scptc | 11 | * |
dc.date.scptcdate | 2018-05-121 | * |
dc.type.docType | Article | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
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