DC Field | Value | Language |
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dc.contributor.author | Kim, SY | - |
dc.contributor.author | Lee, JL | - |
dc.date.accessioned | 2016-04-01T02:03:10Z | - |
dc.date.available | 2016-04-01T02:03:10Z | - |
dc.date.created | 2009-02-28 | - |
dc.date.issued | 2005-10 | - |
dc.identifier.issn | 1598-9623 | - |
dc.identifier.other | 2005-OAK-0000005522 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/24305 | - |
dc.description.abstract | We report enhanced hole injection using an RuOx layer between indium tin oxide anodes and 4,4'-bis[N-(1-naphtyl)-N-phenyl-amino]biphenyl in organic light emitting diodes (OLEDs). The operation voltage of OLEDs at a current density of 100 mA/cm(2) decreased from 17 V to 14 V and the maximum luminance value increased from 1200 cd/m(2) to 2500 cd/m(2) upon transformation of the Ru layer to RuOx by surface treatment using O-2 plasma. Synchrotron radiation photoelectron spectroscopy results showed that the work function increased by 0.4 eV as the Ru layer was transformed to RuOx. Thus, the hole injection energy barrier was lowered, reducing the turn-on voltage and increasing the quantum efficiency of the OLEDs. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | KOREAN INST METALS MATERIALS | - |
dc.relation.isPartOf | METALS AND MATERIALS INTERNATIONAL | - |
dc.subject | OLED | - |
dc.subject | hole injection layer | - |
dc.subject | X-ray photoemission spectroscopy | - |
dc.subject | O-2 plasma treatment | - |
dc.subject | ruthenium oxide | - |
dc.subject | INDIUM-TIN-OXIDE | - |
dc.subject | PHOTOELECTRON-SPECTROSCOPY | - |
dc.subject | WORK FUNCTION | - |
dc.subject | DEVICES | - |
dc.title | High-performance organic light emitting diodes fabricated with a ruthenium oxide hole injection layer | - |
dc.type | Article | - |
dc.contributor.college | 신소재공학과 | - |
dc.identifier.doi | 10.1007/BF03027512 | - |
dc.author.google | Kim, SY | - |
dc.author.google | Lee, JL | - |
dc.relation.volume | 11 | - |
dc.relation.issue | 5 | - |
dc.relation.startpage | 411 | - |
dc.relation.lastpage | 414 | - |
dc.contributor.id | 10105416 | - |
dc.relation.journal | METALS AND MATERIALS INTERNATIONAL | - |
dc.relation.index | SCI급, SCOPUS 등재논문 | - |
dc.relation.sci | SCIE | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | METALS AND MATERIALS INTERNATIONAL, v.11, no.5, pp.411 - 414 | - |
dc.identifier.wosid | 000233372900010 | - |
dc.date.tcdate | 2019-01-01 | - |
dc.citation.endPage | 414 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | 411 | - |
dc.citation.title | METALS AND MATERIALS INTERNATIONAL | - |
dc.citation.volume | 11 | - |
dc.contributor.affiliatedAuthor | Lee, JL | - |
dc.identifier.scopusid | 2-s2.0-30344470526 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 20 | - |
dc.type.docType | Article | - |
dc.subject.keywordAuthor | OLED | - |
dc.subject.keywordAuthor | hole injection layer | - |
dc.subject.keywordAuthor | X-ray photoemission spectroscopy | - |
dc.subject.keywordAuthor | O-2 plasma treatment | - |
dc.subject.keywordAuthor | ruthenium oxide | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Metallurgy & Metallurgical Engineering | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Metallurgy & Metallurgical Engineering | - |
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