One-step preparation of antireflection film by spin-coating of polymer/solvent/nonsolvent ternary system
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SCOPUS
- Title
- One-step preparation of antireflection film by spin-coating of polymer/solvent/nonsolvent ternary system
- Authors
- Park, MS; Lee, Y; Kim, JK
- Date Issued
- 2005-07-26
- Publisher
- AMER CHEMICAL SOC
- Abstract
- An antireflection film was prepared by spin-coating of poly(methyl methacrylate) (PMMA) solution in chloroform in the presence of small amounts of nonsolvent alkanes. When the vapor pressure of a nonsolvent was lower than that of chloroform, a dense skin layer was formed because of the rapid solvent evaporation during spin-coating, whereas increasing the nonsolvent content below this layer resulted in a phase-separated structure. The phase-separated structure below the dense skin layer became a porous layer after the complete evaporation of both chloroform and nonsolvent. Since the film thickness after spin-coating was on the order of hundreds of nanometers, the size of the pores formed at the inner layer was also a few hundred nanometers. The two layers consisting of a dense skin layer and an inner porous layer exhibited excellent antireflection (AR) when coated on glass substrate. By a one-step procedure of spin-coating of PMMA, the film has high transmittance of over 98% at visible wavelengths. Furthermore, due to the dense skin layer in this AR film, an additional spin-coating could be easily performed on this film.
- Keywords
- WET PHASE INVERSION; SURFACE SKIN LAYER; GAS-SEPARATION; POLYSULFONE MEMBRANES; POLYIMIDE MEMBRANE; REFRACTIVE-INDEX; DRY; SELECTIVITY; MECHANISM
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/24462
- DOI
- 10.1021/CM0500758
- ISSN
- 0897-4756
- Article Type
- Article
- Citation
- CHEMISTRY OF MATERIALS, vol. 17, no. 15, page. 3944 - 3950, 2005-07-26
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