Imprinting well-controlled nanopores in organosilicate dielectric films: Triethoxysilyl-modified six-armed poly(epsilon-caprolactone) and its chemical hybridization with an organosilicate precursor

Abstract

A triethoxysilyl-terminated, six-armed poly(e-caprolactone) porogen is synthesized and the terminal groups are found to significantly reduce the aggregation of the porogen molecules in an organosilicate precursor via their hybridization reaction with the precursor. The porogen molecules successfully imprint nanopores in the organosilicate dielectric thin film (see Figure) through their sacrificial thermal decomposition.