Ion energy distribution control in single and dual frequency capacitive plasma sources

Abstract

Particle-in -cell/Monte Carlo simulations are used to study the possibility of ion energy distribution function (IEDF) control on the powered electrode in asymmetric single and double frequency capacitive discharges in argon. The possibility of IEDF control is demonstrated. It is shown that the IEDF shape and spread on the cathode can be controlled by the driven voltage in a single frequency discharge and by the low frequency voltage in a dual frequency capacitive discharge. It is shown that the IEDF shape on the powered electrode can be controlled by the driven frequency in single frequency capacitively coupled plasmas. It is shown that the density of plasma decreases, and the sheath width, the plasma potential and the self-bias voltage increase, with growth of the low frequency voltage in the dual frequency capacitive discharge.