INVESTIGATION OF SURFACE MOLECULAR ORIENTATION OF POLY(DIMETHYLSILOXANE-CO-DIPHENYLSILOXANE)-MODIFIED POLY(AMIC ACID) FILMS USING DYNAMIC CONTACT ANGLE MEASUREMENTS, NEXAFS AND XPS
SCIE
SCOPUS
- Title
- INVESTIGATION OF SURFACE MOLECULAR ORIENTATION OF POLY(DIMETHYLSILOXANE-CO-DIPHENYLSILOXANE)-MODIFIED POLY(AMIC ACID) FILMS USING DYNAMIC CONTACT ANGLE MEASUREMENTS, NEXAFS AND XPS
- Authors
- Kang, JH; Cho, K; Kim, JK; Park, CE; Uhm, SJ; Khatua, BB
- Date Issued
- 2004-01
- Publisher
- VSP BV
- Abstract
- Since poly(dimethylsiloxane)-modified poly(amic acid) was not wetted by the photoresist, poly(dimethylsiloxane-co-diphenylsiloxane)-modified poly(amic acid) was synthesized to improve the wettability of photoresist. From a study on dynamic contact angles of water, the initial advancing contact angles on poly(dimethylsiloxane)-modified poly(amic acid) and those on poly(dimethylsiloxane-co-diphenylsiloxane)-modified poly(amic acid) are almost the same, but the equilibrium advancing contact angles on poly(dimethylsiloxane-co-diphenylsiloxane)-modified poly(amic acid) are much smaller than those on poly(dimethylsiloxane)-modified poly(amic acid). The decrease in equilibrium advancing contact angles on poly(dimethylsiloxane-co-diphenyisiloxane) appears to indicate migration of phenyl groups to the surface in the polar environment. Thus, photoresist could be wetted on the poly(dimethylsiloxane-co-diphenylsiloxane)-modified poly(antic acid) film. Near-edge X-ray absorption fine structure spectroscopy (NEXAFS) and X-ray photoelectron spectroscopy (XPS) were used to investigate the orientation and surface migration of molecules in poly(dimethylsiloxane-co-diphenylsiloxane).
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/24773
- DOI
- 10.1163/1568561042708421
- ISSN
- 0169-4243
- Article Type
- Article
- Citation
- JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, vol. 18, no. 15-16, page. 1815 - 1831, 2004-01
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