Chemically Modified Superhydrophobic WOx Nanowire Arrays and UV Photopatterning
SCIE
SCOPUS
- Title
- Chemically Modified Superhydrophobic WOx Nanowire Arrays and UV Photopatterning
- Authors
- Kwak, G; Lee, M; Yong, K
- Date Issued
- 2010-06-15
- Publisher
- AMER CHEMICAL SOC
- Abstract
- A facile route is reported for the fabrication of superhydrophobie tungsten oxide (WOx) nanowire surfaces through the chemical adsorption of alkyltrichlorosilane with a static water contact angle (CA) of 163.5 degrees. It is confirmed that CAs on the superhydrophobic surface decreased gradually under UV illumination because of the UV-assisted decomposition of alkyltrichlorosilane chemically adsorbed onto the surface. Superhydrophobic-superhydrophilic switching is also demonstrated by alternating self-assembled monolayer deposition and UV irradiation on the photopatterned nanowire surfaces. Furthermore, the superhydrophobic surface could be transformed selectively into a hydrophilic state by simply exposing the surface to UV through a shadow mask. These studies provide a relatively simple strategy for the design of superhydrophobic surfaces Mater.
- Keywords
- SELF-ASSEMBLED MONOLAYERS; LIGHT-DRIVEN PHOTOCATALYSTS; TUNGSTEN-OXIDE; VISIBLE-LIGHT; TEXTURED SURFACES; ORGANIC-COMPOUNDS; NANOROD FILMS; WETTABILITY; TRANSITION; DECOMPOSITION
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/25495
- DOI
- 10.1021/LA100022B
- ISSN
- 0743-7463
- Article Type
- Article
- Citation
- LANGMUIR, vol. 26, no. 12, page. 9964 - 9967, 2010-06-15
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- There are no files associated with this item.
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