Vertical Density Profiles of Various Photoresists and Top-coats by X-ray Reflectivity Analysis
- Title
- Vertical Density Profiles of Various Photoresists and Top-coats by X-ray Reflectivity Analysis
- Authors
- Ahn, SI; Kim, JH; null
- Date Issued
- 2009-01
- Publisher
- TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN
- Abstract
- Vertical electron density profiles of various photoresist, top-coat and their combinations as bilayers were obtained from X-ray reflectivity analysis. The result suggests that there are specific layers with different electron density near the surface of photoresists and top-coats films. The investigation on bilayer films which consist of photoresist and top-coat shows that the intermixing of two materials and the roughness of films are varied by annealing (baking) time and temperature.
- Keywords
- immersion lithography; photoresist; top-coat; X-ray reflectivity
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/26593
- ISSN
- 0914-9244
- Article Type
- Article
- Files in This Item:
- There are no files associated with this item.
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