DC Field | Value | Language |
---|---|---|
dc.contributor.author | Li, YH | - |
dc.contributor.author | Ahn, KD | - |
dc.contributor.author | Kim, DP | - |
dc.date.accessioned | 2016-04-01T07:43:13Z | - |
dc.date.available | 2016-04-01T07:43:13Z | - |
dc.date.created | 2016-02-26 | - |
dc.date.issued | 2015-03 | - |
dc.identifier.issn | 1042-7147 | - |
dc.identifier.other | 2015-OAK-0000033300 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/26797 | - |
dc.description.abstract | Photosensitive acrylated polyvinylsilazanes were prepared by reacting a diacrylate containing compound, 1,1-bis (acryloyloxyethyl) ethyl isocyanate (BAEI), with polyvinylsilazane (PVSZ) and utilized as an inorganic photoresist for generating SiCN-based ceramic microstructures. The acrylate-modified polymers (m-PVSZ) were characterized by H-1-NMR, C-13-NMR and FT-IR methods to determine the chemical reaction mechanism. Differential photo-calorimeter and FT-IR analysis were employed to examine its photosensitive properties. Line patterns were fabricated by a UV nano-imprinting method; multi-layered octagon structures were fabricated by a two-photon absorption stereolithography process. The results indicate that m-PVSZ is quite a novel inorganic photoresist for the fabrication of micro ceramic structures. Copyright (c) 2015 John Wiley & Sons, Ltd. | - |
dc.description.statementofresponsibility | X | - |
dc.language | English | - |
dc.publisher | WILEY-BLACKWELL | - |
dc.relation.isPartOf | POLYMERS FOR ADVANCED TECHNOLOGIES | - |
dc.title | Synthesis and properties of UV curable polyvinylsilazane as a precursor for microstructuring | - |
dc.type | Article | - |
dc.contributor.college | 화학공학과 | - |
dc.identifier.doi | 10.1002/PAT.3448 | - |
dc.author.google | Li, YH | - |
dc.author.google | Ahn, KD | - |
dc.author.google | Kim, DP | - |
dc.relation.volume | 26 | - |
dc.relation.issue | 3 | - |
dc.relation.startpage | 245 | - |
dc.relation.lastpage | 249 | - |
dc.contributor.id | 10054896 | - |
dc.relation.journal | POLYMERS FOR ADVANCED TECHNOLOGIES | - |
dc.relation.sci | SCI | - |
dc.collections.name | Journal Papers | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | POLYMERS FOR ADVANCED TECHNOLOGIES, v.26, no.3, pp.245 - 249 | - |
dc.identifier.wosid | 000349677000005 | - |
dc.date.tcdate | 2019-02-01 | - |
dc.citation.endPage | 249 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 245 | - |
dc.citation.title | POLYMERS FOR ADVANCED TECHNOLOGIES | - |
dc.citation.volume | 26 | - |
dc.contributor.affiliatedAuthor | Kim, DP | - |
dc.identifier.scopusid | 2-s2.0-84922811379 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
dc.description.wostc | 5 | - |
dc.description.scptc | 4 | * |
dc.date.scptcdate | 2018-05-121 | * |
dc.type.docType | Article; Proceedings Paper | - |
dc.subject.keywordPlus | INORGANIC POLYMER | - |
dc.subject.keywordPlus | CERAMIC MICROSTRUCTURES | - |
dc.subject.keywordPlus | 2-PHOTON POLYMERIZATION | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | COATINGS | - |
dc.subject.keywordPlus | FUTURE | - |
dc.subject.keywordPlus | MEMS | - |
dc.subject.keywordAuthor | polyvinylsilazne | - |
dc.subject.keywordAuthor | photoresist | - |
dc.subject.keywordAuthor | UV curing | - |
dc.subject.keywordAuthor | microstructure | - |
dc.relation.journalWebOfScienceCategory | Polymer Science | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Polymer Science | - |
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