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High-performance triethylsilylethynyl anthradithiophene transistors prepared without solvent vapor annealing: the effects of self-assembly during dip-coating SCIE SCOPUS

Title
High-performance triethylsilylethynyl anthradithiophene transistors prepared without solvent vapor annealing: the effects of self-assembly during dip-coating
Authors
Sooji NamJaeyoung JangJohn. E. AnthonyJong-Jin Park,Park, CEKinam Kim
Date Issued
2013-03-27
Publisher
American Chemical Society
Abstract
Solution-processable small-molecule organic semiconductors have recently attracted significant attention for use as the active channel layers in organic field-effect transistors due to their good intrinsic charge carrier mobility and easy processability. Dip-coating is a good method for optimizing the film morphology and molecular ordering of the small-molecular semiconductors because the drying speed can be quantitatively controlled at the air-solution-substrate contact line. Here, we report the preparation of highly crystalline triethylsilylethynyl-anthradithiophene (TES-ADT) crystal arrays that exhibit an excellent field-effect mobility (up to 1.8 cm(2)/(V s)) via an optimized one-step dip-coating process. High-quality TES-ADT crystals were grown without solvent vapor annealing postprocessing steps, which were previously thought to be essential for improving the morphology, crystallinity, and electrical characteristics of TES-ADT thin films. An interesting correlation between the optimal pull-out rate and the self-assembly tendencies of some soluble acene semiconductors was observed, and the origin of the correlation was investigated. Our work demonstrates an alternative simple approach to achieving highly crystalline TES-ADT thin films, and further proposes a prospective method for optimizing the formation of thin films via the molecular self-assembly of soluble acenes.
URI
https://oasis.postech.ac.kr/handle/2014.oak/27433
DOI
10.1021/AM303192B
ISSN
1944-8244
Article Type
Article
Citation
ACS APPLIED MATERIALS & INTERFACES, vol. 5, no. 6, page. 2146 - 2154, 2013-03-27
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박찬언PARK, CHAN EON
Dept. of Chemical Enginrg
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